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High Energy Beam Test and Simulation of Silicon-Tungsten Calorimeter Test Module

High Energy Beam Test and Simulation of Silicon-Tungsten Calorimeter Test Module. Shinwoo Nam (Ewha Womans University).

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High Energy Beam Test and Simulation of Silicon-Tungsten Calorimeter Test Module

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  1. High Energy Beam Test and Simulation of Silicon-Tungsten Calorimeter Test Module Shinwoo Nam (Ewha Womans University) On behalf of Ewha Womans University: S.J. Baek, H.J. Hyun, S. Nam, I.H. Park, J. Yang Korea University: J.S. Kang, S.K. Park, J.H. ChoiKyungpook National University: Y.D. Oh, K.H. Han, D.H. Kim, J.S. Seo, U.C. YangSungkyunkwan University: I.T. Yu, Y.P. YuYonsei University: B.S. Jang, S.H. Jeong, J.H. Kang, Y.J. Kwon

  2. Previous studies have shown that the precision level of jet measurement required for ILC physics can be achieved by reconstructing all single particle showers in a jet. This leads us to two requirements for calorimeter : small Moliere radius and fine granularity. Silicon-Tungsten Calorimeter is a natural candidate of EM calorimeter meeting the conditions. Introduction

  3. Content • Development of Silicon Sensor • Electronics and Mechanics of Test Module • MC Simulation • Beam Test Result • Summary

  4. Silicon Sensor (Pixellated PIN Diode) 20um 60um Pixels(Signal) Guard Ring SiO2 p+ 380㎛ N-type silicon wafer of 5 ㏀ Al • Fabricated on 380um 5’ wafer • A Sensor Size : 6.52*5.82 cm2 (including 3 guard rings ) • Pixel array : 4*4 matrix • 1.55 * 1.37 cm2 each • DC coupled • Full depletion voltage : 90V • Leakage current level : about 3 nA per pixel at full depletion voltage 3 Guard Rings

  5. Clean wafer Oxidation N+Diffusion Cover with photoresist Expose through mask Develop Etch, Stip P+ImplantationAnneal Metallization Process of Silicon Fab, Sawing, Bonding Wafer -> Fabricated PIN diode matrix Mass Production Fabrication made at SENS Technology (www.senstechnology.co.kr) Sawing / attach Kapton tape Kapton tape has patterned Cu wiring(50um) on it for readout Wire bonding For wire boning to the diode pixel, Al wire with diameter 25 um was used. Recently we added one more wire to reduce risk of bonding failure Glob Top (DCE, DP100) For protection of bonded wire. It is important to put the glob top in Vacuum to remove the air bubbles in glue. Fabrication process

  6. Capacitance Measurement 1/c2 Full depletion voltage for 5kOhm wafer sensor: about 85-90V Applied 100V because of variation in the thickness and resistivity of wafers

  7. Leakage Current Measurement (10nA) ~3nA per pixcel at full depletion voltage ! Close to 90% yieldwith quality cut of 20nA/pixel at 100V !

  8. Dark box sensor Photodiode Pb Pb Beta (90Sr) source S/N Ratio Measurement with Sr-90 source(use of single channel very low noise preamp) Trigger Photodiode Discriminator GateGenerator ShapingAMP S/N ~ 120 PreAmp PreAmp for sensor

  9. 16 pixels ADC Frontend Readout with CR1.4 chip Gain Linearity Test Using charge calibration Function of chip • Developed for the Pamela Experiment • 16 channels of charge inputs (integrating the charge pulses -> DC levels) • Gain: 1mV/fC • Dynamic Range: to 4000 MIPs • up to 150 pF capacitance with leakage currents as high as 100 nA. It measures charge from 2.2 fC to 9 pC. • Noise ~ 5000 e • Power: 0.3 mW/ch • The outputs of the T/H circuits are multiplexed to a common output buffer that is capable of driving a load of 1k and 100 pF. • The output of the chip swings from -3V to 4V CR1.4 chip handles a 16-ch Si sensor Frontend board with 7 CR chips

  10. Digital Electronics : ADC, Control, Power Board • ADC: MAX 1133 • Sampling Speed : 200ksps • (200ksps X 16bit = 0.4Mbyte/s) • Resolution : 16bit (65536 Levels) Power Control DC Voltage High Voltage FPGA DAQ board Frontend Board ACP Board ADCs PC

  11. Integration Test of Electronics and DAQ readout speed : 0.1 msec for full readout ADC : 16 bits Data IO, Command, Calibration Boards ADC, Control Board Total 640 readout channels

  12. Tungsten and Mechanics thickness : 3.5 mm (= 1 X0) Size 65.5 mm X 57.5 mm ( ~ sensor size) Tungsten Test Module : 20 layers stacked Frontend board Mount holes Aluminum Support of a Layer

  13. Aluminum 1.5 mm Sensor and Readout 10 mm Tungsten 3.5 mm 15 mm Thickness of an Assembled Layer Connector 2.7 mm Capacitor 1.4 mm Pcb 1.7 mmResistor 0.65 mm Diode 1.15 mm CR 1.4 chip 2.45 mm Shielding board 1mm 1mm inactive gap between sensors Silicon Sensor 32 pixels in a layer 131mm X 115mm Frontend Board

  14. Layers of Si sensors and Tungstens Digital and Control Boards Frontend readout boards Beam Direction

  15. Summary of Our Test Module Geometry • Total 20 layers = 20X with uniform layer thickness • Shower sampling at 19 layers with 2 sensors each layer. • 1mm gap between sensors • Aligned beam center to the center of a sensor 1mm inactive gap Effective RM :~ 45mm from volume ration of material RM 131mm X 115mm -> insufficient transverse shower containment No action taken for cooling the detector. Temperature level during test : ~35 to 40 deg

  16. <30GeV, e-, for 1/500 event> Electron Longitudinal Shower Profiles E(MeV) 100GeV 50GeV Radius(mm) 10GeV RM is about 45mm Geant4 Simulation Geant4.7 with full official high energy physics list, Detector geometry same as real test module, Fixed beam gun without spread, Detector responses in terms of pure energy loss (no noise and digitization)

  17. Fitted curve to… 18 % / √E Geant Simulation total energy loss in silicon layers vs. electron beam energy dE/E vs. E MeV GeV GeV <20GeV> <50GeV>

  18. CERN Beam Test Steps of Beam Test 1. Tune trigger time delay 2. Align detector by using movable table under the our detector 3. MIP calibration of all channels (using hadron beam (less spread) after removing all tungstens) 4. Data Run (electron 150,100,80,50,30,20,10 GeV hadron 150 GeV muon 150 GeV) random trigger mixed in the runs for pedestal monitor beam Thanks A. Malinine for the test beam line control Beam Test : CERN SPS H2 beam line for a week till Sep. 7 2004 Beam cycle 18.0 sec with 4.8 sec spill time beam line focus & existing trigger scintillators give beam spread of ~1 cm diameter Beam focus worse in muon beam

  19. Channel Scan for MIP calibration Scanned over all 640 channels with 100 GeV hadron Beam (no tungsten) Pedestal : Gaussian Fit Mean : 5206.9 Sigma : 7.2 Signal : Landau Fit Peak : 5243 an example of a sensor with all good pixels S/N = 5.2 ADC Counts

  20. Detector Response to Different Particles Random Trigger events (total pedestal) 50 GeV Electron Online Shower Profile Monitor Pedestal subtracted 50 GeV pion First Analysis : sum ADC counts of all channels No rejection of dead, noisy channels, No gain calibration applied 150 GeV Muon Total ADC of an event / 640

  21. Detector Response to Different e- Energy Shower 150 GeV 100 GeV 80 GeV Readout Pedestals from Random Trigger 50 GeV 30 GeV 20 GeV 10 GeV Total ADC of an event / 640

  22. Calorimeter Calibration Preliminary Total ADC above pedestal / 640 Straight Fit Line 1GeV <--> 4.2 * 640 ADC Counts Linear response, No saturation Electron Energy in GeV

  23. Energy Resolution Preliminary • Geant4 simulation of this setup taking into account only shower leakage gives 18%/√E. • Simulation with dead channels (~2%),noisy channels (~10%), ADC unstable(~10%) : 21%/√E. • Further analysis needed to study the influence of beam spread,insufficientgaincalibration, and readout channel cross-talks. Fit curve : 29%/√E dE / E (%) Electron Energy in GeV

  24. Summary • High-quality Silicon pixel sensors were successfully developed and produced. - the yield close to 90% (better than initial expectation) • excellent quality, typically Id <=10nA/cm2 • Si-W Test Module was built and exposed to the high-energy beams - Obtained typical performance as an EM calorimeter in the detector responses to the different beam energy and particle type. • Preliminary result of electron energy resolution : 28%/√E, • MC result : 18%/√E for perfect readout 21%/√E taking into account of noisy and bad channels - Under study for the effect of gain calibration, beam spread, and cross-talks in readout electronics • Further tests of silicon sensors with more practical integration condition is in preparation.

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