Thin Films. Polish. Patterned wafer. Etch. Photo. Diffusion. Test/Sort. Implant. *. ME 598 – Lecture 2 - Photolithography. Ultraviolet Light. Chrome island on glass mask. Exposed area of photoresist. Window. photoresist. Shadow on photoresist. photoresist. oxide. oxide.
Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author.While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server.
ME 598 – Lecture 2 - Photolithography
Chrome island on glass mask
Exposed area of photoresist
Shadow on photoresist
silicon substrateNegative Tone
Areas exposed to light become polymerized and resist the develop chemical.
Resulting pattern after the resist is developed.
Overcut (aka lift-off):
Used for material deposition after photolithography step
1 μm trench 2 μm mask lines
Resist thickness z
(S + )
R = Bmin =Shadow Printing Resolution
Shadow printing (Contact and Proximity)
s = separation
z = resist thickness
What happens when s goes to 0 (contact printing)?
What happens when s>>z (proximity printing)?
What is the difference between AZ 1518 and AZ 4620?
what does immersion lithography do to DOF? http://spie.org/x8368.xml?ArticleID=x8368
Topic can NOT be your thesis work.