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Etching Rates of Polyethylene Using a Barrel Plasma Etcher

June 12, 2012. Plasma Etcher, ChE 414. 2. Presentation Overview. ObjectivesBackground/TheoryPlasma Etcher Set-up/OperationDesign of ExperimentResultsRecommendations/TipsQuestions. June 12, 2012. Plasma Etcher, ChE 414. 3. Project Objectives. Become Familiar with a Barrel Plasma EtcherDetermi

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Etching Rates of Polyethylene Using a Barrel Plasma Etcher

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    1. Etching Rates of Polyethylene Using a Barrel Plasma Etcher February 16, 2005 Oregon State University Chemical Engineering 414 Collin Matsumoto (Team Leader) Arta Pecaj (Operations Coordinator) Brian Michael (Safety Coordinator)

    2. June 13, 2012 Plasma Etcher, ChE 414 2 Presentation Overview Objectives Background/Theory Plasma Etcher Set-up/Operation Design of Experiment Results Recommendations/Tips Questions

    3. June 13, 2012 Plasma Etcher, ChE 414 3 Project Objectives Become Familiar with a Barrel Plasma Etcher Determine Optimal Operating Conditions for Removal of LDPE, MDPE and HDPE by varying: Flow Rate of O2 and N2 Pressure Plasma Generation Power

    4. June 13, 2012 Plasma Etcher, ChE 414 4 Background What is Plasma Etching? Using Reactive Gases to Strip Away Small Amounts of Substance; O2 and N2 with Polyethylene (PE) in this Case Where is it Used? Microelectronics Industry

    5. June 13, 2012 Plasma Etcher, ChE 414 5 How Does Plasma Etching Work? Radio Frequency (RF) Power Excites Molecules and Causes the Formation of Radicals Vacuum Conditions Allow for Large Mean-Free-Path Radicals React with Surface to Etch Polymer

    6. June 13, 2012 Plasma Etcher, ChE 414 6 Ideal Gas Law PV=nRT n a P because V, R, T are Constant P=Pressure V=Volume n=Number of Moles of O2 R=Gas Constant T=Temperature

    7. June 13, 2012 Plasma Etcher, ChE 414 7 Plasma Etcher Set-up

    8. June 13, 2012 Plasma Etcher, ChE 414 8 Inside the Reactor

    9. June 13, 2012 Plasma Etcher, ChE 414 9 Surface Reaction http://che.oregonstate.edu/sesey/03/ppt/etch/272,7,Slide 7

    10. June 13, 2012 Plasma Etcher, ChE 414 10 Reactor In Action

    11. June 13, 2012 Plasma Etcher, ChE 414 11 Theory http://che.oregonstate.edu/sesey/03/ppt/etch/272,7,Slide 7

    12. June 13, 2012 Plasma Etcher, ChE 414 12 Design of Experiment

    13. June 13, 2012 Plasma Etcher, ChE 414 13 Assumptions Etching Only Occurs on Top Surface Even Etching Over Entire Surface Ten Minute Runs rLDPE=0.92; rMDPE=0.94; rHDPE=0.95 Surface AreaLDPE=14 cm2 Surface AreaMDPE=18.75 cm2 Surface AreaHDPE=19 cm2

    14. June 13, 2012 Plasma Etcher, ChE 414 14 Factorial Analysis PowerLow=400W; PowerHigh=800W O2 RatioLow=1O2:4N2; O2 RatioHigh=4O2:1N2

    15. June 13, 2012 Plasma Etcher, ChE 414 15 LDPE Factorial Analysis Higher Power and O2 Flow Rates Have a Greater Effect on LDPE Etching Rates

    16. June 13, 2012 Plasma Etcher, ChE 414 16 MDPE Factorial Analysis Above 500W, Higher O2 Flow Rates Have a Greater Effect on Etching Rates

    17. June 13, 2012 Plasma Etcher, ChE 414 17 HDPE Factorial Analysis Above 450W, Higher O2 Flow Rates Have a Greater Effect on Etching Rates

    18. June 13, 2012 Plasma Etcher, ChE 414 18 Problem with Factorial Analysis? RF Power is Too High Insufficient Time to Re-Run Data

    19. June 13, 2012 Plasma Etcher, ChE 414 19 LDPE Etch Rates Optimal Condition at 1.00Torr and 600W

    20. June 13, 2012 Plasma Etcher, ChE 414 20 MDPE Etch Rates Optimal Condition at 1.00Torr and 400W

    21. June 13, 2012 Plasma Etcher, ChE 414 21 HDPE Etch Rates Optimal Condition at 1.00Torr and 400W

    22. June 13, 2012 Plasma Etcher, ChE 414 22 Reasons for Errors Running Time Too Long Operating Power Too High Samples Placed Directly on Tray Samples Not Placed Down Center of Reactor

    23. June 13, 2012 Plasma Etcher, ChE 414 23 Insufficient N2 Data Collected Due to a Time Shortage, Not Enough Data Points were Collected to Make an Analysis

    24. June 13, 2012 Plasma Etcher, ChE 414 24 Conclusions Etch Rates for LDPE, MDPE and HDPE Tended to Follow Theory of Higher Etch Rates at Lower Pressures and Higher Power Flaws in DOE Caused Poor Data

    25. June 13, 2012 Plasma Etcher, ChE 414 25 Recommendations for Future Use Hook Up Thermocouple Invest in Mass Flow Controller (s) Use Evenly Sized Samples Actually Etch Off Of Wafer

    26. June 13, 2012 Plasma Etcher, ChE 414 26 Tips to Future Groups Determine Density and Surface Area Prior to Data Collection Running Time Between 5-7min R.F. Power Lower Than 500W Place Samples in Center of Barrel

    27. June 13, 2012 Plasma Etcher, ChE 414 27 Works Cited http://www.dow.com/polyolefins/about/polyeth.htm. 14Feb2005 http://www.plasticsusa.com/pe.html. 14Feb2005 http://che.oregonstate.edu/sesey/03/ppt/etch/272,7,Slide 7. 14Feb2005. Belser, T.H. Lin and Yonhua Tzeng. “Pulsed Microwave Plasma Etching of Polymers in Oxygen and Nitrogen for Microelectronic Applications.” IEEE Transactions on Plasma Science. Vol. 16 No. 6 December 1988.

    28. Questions?

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