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NanoFab Trainer Update

NanoFab Trainer Update. Nick Reeder, April 25, 2014. Update to User Interface. User can now select the substrate material when starting a new design. Update to Exposure Code.

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NanoFab Trainer Update

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  1. NanoFab Trainer Update Nick Reeder, April 25, 2014

  2. Update to User Interface • User can now select the substrate material when starting a new design.

  3. Update to Exposure Code • Code that creates UV intensity profile now flattens the top of the gaussian profile for wide mask openings and close distances. As the opening narrows or the distance increases, this flattening diminishes. • A look-up table determines how quickly the flattening diminishes as distance increases. How to populate this look-up table with realistic numbers?

  4. Sample Run with Varying Mask Opening Widths Next slide shows intensity profile for this exposure.

  5. Sample Run with Varying Mask Opening Widths

  6. Update to Exposure Code • Code now handles cases where layer thicknesses are constant for each mask opening, but different for different openings. • Sample run:

  7. Next Steps for Exposure Code • Code still can’t handle cases where Layer thicknesses vary within a mask opening: • Difficulty arises from the fact that the rising edge is slant, not vertical. • See next slide for proposed strategy.

  8. Proposal for Rewriting Exposure Code Current code Compute intensity profile. Specify layer thicknesses. Process grid & structure. -Begin loop for all x. -Begin loop for all t. Compute M. Compute field shoot. Process image t. -End loop for all t. -End loop for all x. Proposed code -Begin loop for all x. Compute intensity at x. Specify layer thicknesses at x. Process grid & structure at x. -Begin loop for all t. Compute M. Compute field shoot. Process image t. -End loop for all t. -End loop for all x.

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