Plasma diagnostics for the deposition of nanomaterials
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REU: Mechanical Engineering University of Arkansas July 20, 2009. Plasma Diagnostics for the Deposition of Nanomaterials. Jay Mehta Undergraduate Student, University of Arkansas, Fayetteville, Arkansas 72701, USA Faculty Mentor: Dr. Matthew H. Gordon

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Plasma Diagnostics for the Deposition of Nanomaterials

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Plasma diagnostics for the deposition of nanomaterials

REU: Mechanical Engineering

University of Arkansas

July 20, 2009

Plasma Diagnostics for the Deposition of Nanomaterials

Jay Mehta

Undergraduate Student, University of Arkansas, Fayetteville, Arkansas 72701, USA

Faculty Mentor: Dr. Matthew H. Gordon

Associate Professor of Mechanical Engineering, University of Arkansas, Fayetteville, Arkansas 72701, USA

Ph.D. Graduate Student Mentor: Sam Mensah

Graduate Student, University of Arkansas, Fayetteville, Arkansas 72701, USA

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Why alpha alumina

Why alpha alumina?

  • Many desirable properties:

    • high melting temperature (2053 °C)

    • Considered best anti—oxidation coating at high temps

    • corrosion resistance

    • chemical inertness

    • High mechanical strength and hardness (24GPa)

    • Great insulating properties

  • Applications:

    • Optical coatings

    • Thermal coatings

    • Dielectric films

    • Cutting tools

    • Biomedical implants

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Goals

Goals

  • Long term:

    • Connecting spectroscopy results with film quality

    • Better understanding of alpha alumina

  • Short term:

    • Using OES to observe and study plasma in deposition chamber under varying conditions

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


What is oes

What is OES?

  • Optical Emission Spectroscopy

    • Spectrometer captures data from captured photons

    • Produces a spectrograph

    • Relative intensity of peaks can be used to determine ion density

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Equipment used

Equipment Used

  • ICM10

    • Midfrequency inverted cylinder AC magnetron sputtering system

    • Used for Physical Vapor Deposition

    • For our case depositing Alumina (Al2O3)

      • Target: Aluminum

      • Reactive Gas: Oxygen

      • Sputtering Gas: Argon

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Equipment used1

Equipment Used

  • USB 4000

    • Interprets and captures an optical signal from the ICM 10 system

    • Compact and usb operated

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Software used

Software Used

  • System Software:

    • Used to vary power and gas flow rates

  • Spectrasuite:

    • Used to with USB 4000 to collect optical data

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Experiment

Experiment

  • Created recipes:

    • 4 Variables:

      • Pressure: 2-8 mtorr with 3 mtorr increments

      • Power: 4-6 kW with 0.5 kW increments

      • Total Gas Flow: 40-70 sccm with 10 sccm increments

      • Oxygen Partial Pressure: 35-75% with 5% increments

    • Time per run: 100 seconds

    • Integration time: 2 seconds

    • Scans per run: 1

    • Total scans: 540+

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Results

Results

  • Peak identification:

    • Unable to locate Aluminum peaks

    • Many Argon peaks

    • Few Oxygen Peaks

  • Representative peaks:

    • Argon peak at 763.51nm

    • Oxygen peak at 777.194nm

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Results1

Results

  • Argon Trends

    • Predictable

      • Increasing power=increasing intensity

      • Increasing oxygen partial pressure=decreasing intensity

      • Increasing pressure=slight increase in intensity

    • Outliers caused by pressure changes due to oxygen reactions

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Results2

Results

  • Oxygen

    • Expected trends:

      • Linearly increasing oxygen intensity with increasing oxygen partial pressure

      • Increasing oxygen intensity with increasing power (graphs)

      • Fairly consistent results at higher pressures

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Results3

Results

  • Oxygen

    • Notable:

      • Very low oxygen intensity at 50 sccm throughout experiments

      • Peak in oxygen intensity after 4.5-5 kW for 50 sccm

      • Unusually low intensity at 6 kW for Pr2

      • At higher powers Pressure didn’t have much effect

    • Jumps:

      • Between 55%-75% Oxygen at Pr2Tg40Pw4

      • Between 50%-60% Oxygen at Pr2Tg60Pw4.5

      • Between 55%-60% Oxygen at Pr2Tg50Pw4

      • Between 35%-55%Oxygen at Pr2Tg40 jump from Pw4 to 4.5

      • Between 55%-65%Oxygen at Pr2Tg40Pw4

      • Jump in intensity from 2 to 5mtorr for Tg50 all powers

      • Jump in intensity from 2 to 5mtorr for Tg60Pw4

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Conclusion

Conclusion

  • Study jumps in oxygen intensities

    • Target poisioning

    • Pressure and power changes

  • Further experiments:

    • Hysteresis studies

    • observing aluminum vs. oxygen intensities

    • Test theories in deposition runs

    • Compare with Langmuir probe data

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


Reu mechanical engineering university of arkansas july 20 2009

REU: Mechanical EngineeringUniversity of ArkansasJuly 20, 2009

Questions?

  • Questions?

University of Arkansas

Fayetteville, Arkansas 72701

www.uark.edu


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