Stanford. HP. MIT. Startup X. UCB. users. Information. vendors. Chips. Mask maker. Dicing and packaging. Orbit 2um. HP 0.5um. Foundry Services: MOSIS as a model. MOSIS: MOS implementation service, ISI, 1980. MOSIS. $$$$$. Foundry Services and Standard Processes.
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... and spacingDesign Rules
Rules for line/space on all mask layers.
Examples for POLY2 from
Polys are compressive, nitride
and metal (Cr/Au) are tensile.
A, W, L must be greater than or equal to 20.0 microns.
Photoresist aspect ratio, L/W, must be less than or equal to 10.