1 / 2

Optimizing Femtosecond Laser Crystallization for Advanced 3D Optical Circuit Fabrication

Researchers at Lehigh University have advanced femtosecond (fs) laser technology for crystal growth in 3D optical circuits. Their findings reveal that nucleation occurs in two steps: defect formation from laser-induced voids, followed by internal surface nucleation. The focal depth significantly influences temperature distribution and nucleation processes. A new continuous-wave laser crystallization facility has been established, enhancing research opportunities across materials science and engineering disciplines. This facility, equipped with a 488 nm laser and a custom interface, enables the creation of complex crystalline structures tailored for various applications.

john
Download Presentation

Optimizing Femtosecond Laser Crystallization for Advanced 3D Optical Circuit Fabrication

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript

  1. A unique aspect of femtosecond (fs) laser crystallizationHimanshuJain, Lehigh University, DMR 0906763 In general, nucleation is the first stage of crystal growth technology that is widely used in microelectronics, photonics, and other technologies. When pursuing the novel crystal growth for fabricating 3D optical circuits using fs laser, the researchers at Lehigh University have discovered that nucleation itself consists of two steps (Fig. 1): (a) formation of laser-induced defects (voids) at the bottom of heat-modification (black arrows), followed by (b) internal surface nucleation at defect sites leading to crystal growth (white arrows). The focaldepth affects temperature distribution (Fig. 2), void formation and the nucleation process. For details, see Opt. Mater. Exp. 1(5) (2011) 990. Fig. 2: Calculated temperature distribution Fig. 1: Timeline of irradiation and crystallization (laser incident from above). • This discovery shows that process parameters for the emerging fs crystal ‘writing’ technique need to be optimized with respect to the depth at which laser is focused.

  2. A new laser crystallization facility is nucleatedHimanshuJain, Lehigh University, DMR 0906763 To promote the concept of ‘laser writing’ for broad range of applications in glasses and crystals, a dedicated continuous-wave laser crystallization system has been nucleated at Lehigh University. It is available to students and researchers from diverse backgrounds in Materials Science & Engineering, Physics and Electrical Engineering departments. Currently, the system includes a 488 nm laser with tunable power, 50x objective lens, digital camera, and XYZ stage (Fig. 1(a)), with custom interface capable of producing bends and smooth curves (Fig. 1(b)). It is being expanded to accommodate new functions like in-situ Raman spectroscopy. Interested researchers can modify the surface region of solids for specific functionality. (c) (a) (b) Fig. 1: (a) Laser optics and stage setup, (b) the laser control allows fabrication of complex shapes, and (c) example of crystalline lines of widely used LiNbO3as written in a glass.

More Related