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Process Quality Control Updates from CMS: Test Structures and Measurements Report

This report details the latest findings and updates from the CMS process quality control team, focusing on the characterization of various test structures and measurement methodologies employed across the three qualification centers: Florence, Strasbourg, and Vienna. Key highlights include temperature-dependent stability tests on CVMOS structures, efficiency changes in aluminum conductivity, and updates on mask issues affecting probe card functionality. Additionally, new software integration enhances data handling and analysis for test structure database management.

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Process Quality Control Updates from CMS: Test Structures and Measurements Report

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  1. News from CMS Process Quality Control Thomas Bergauer HEPHY Vienna CMS TK Week, 29.1.2003, CERN

  2. Centers • Three Process Qualification Centers: Florence Anna Macchiolo Carlo Civinini Mirko Brianzi Strasbourg Jean-Charles Fontaine Jean-Marie Helleboid Jean-Laurent Agram Vienna Thomas Bergauer Margit Oberegger Characterization by QTC Process stability on test structures with 9 different measurements Thomas Bergauer, HEPHY Vienna

  3. CVmos at different temperatures • Just a test (Vienna coolingbox was available) • CVmos at 5 different temperatures • CVmos chosen because it is the simplest measurement • No temperature dependence of Vfb Thomas Bergauer, HEPHY Vienna

  4. Thicker Aluminium • 39 Teststructures from PQC Florence • Perugia 12 (prod.week 34/02) • Perugia 13 (03/02) • Perugia 14 (06/02 and 23/02) • Pisa 59 (08/02) • Pisa 60 (24/02) Influence to rho_Alu after Before week 20/02 • Average data: • before Week 20/02: • 26,09mOhms/sq. • After week 20/02: • 14,34mOhms/sq. • Also: slightly lower C_ac value: • 17,01pF (before week 20/02) -> • 16,65pF (after) Thomas Bergauer, HEPHY Vienna

  5. Mask Problem W7B • Misalignment of 3 structures at the standard half moon • Not able to contact with probecard in one cycle • W7B: 1440 pcs. Cac R (Al, p+, poly) Ivgcd Cint IVbaby Rint CVdiode CVMOS & IV diel Thomas Bergauer, HEPHY Vienna

  6. Mask Problem W7B • 3 structures on the standard half moon affected • Sensor mask is OK • Options: • new probecard design OR • new wafer mask design GCD C_int Thomas Bergauer, HEPHY Vienna

  7. Inter-calibration • Circulation of 5 Teststructures • Vienna -> Strasbourg • Strasbourg -> Florence • Florence -> Vienna -> Florence -> Vienna -> Strasbourg (Exchange of TS during this Tracker Week) • Results: (up to now) • Good agreement in all measurements • Higher Leakage current of Vienna Probecard causes lower R_int and higher IV_dielectric and GCD problems (fit) • small differences in capacitances values caused by stray capacitances. (<1pF) Thomas Bergauer, HEPHY Vienna

  8. Software • New Software allows re-read of local files • Up to now: Stand-alone program • Re-analyze • Re-write XML file Acquisition Analysis DB Interface Main: Local files Analysis DB Interface new: • Future: • Fully integrated into acquisition software Acquisition Analysis DB Interface Local files Thomas Bergauer, HEPHY Vienna

  9. Database • 322 teststructures successfully loaded into db • 61 faulty • (status: 28.1.03) Thomas Bergauer, HEPHY Vienna

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