REMOVING SURFACE CONTAMINATES FROM SILICON WAFERS. Jed Johnson Brigham Young University. Reflectors in EUV range. EUV range is about 100-1000Å General Challenges: - multilayers required - absorption - high vacuum needed Applications - XUV lithography - Soft x-ray microscopy
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Brigham Young University
- multilayers required
- high vacuum needed
- XUV lithography
- Soft x-ray microscopy
Reduced Reflectance with Hydrocarbon Thickness. Theoretical change in reflectance vs. grazing angle and organic thickness. (at λ=40.0 nm)