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Design and Implementation of VLSI Systems (EN1600) lecture05

Design and Implementation of VLSI Systems (EN1600) lecture05. Sherief Reda Division of Engineering, Brown University Spring 2008. [sources: Weste/Addison Wesley]. Summary of Terminology. body diffusion (n/p) source drain well tap contact metal track via

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Design and Implementation of VLSI Systems (EN1600) lecture05

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  1. Design and Implementation of VLSI Systems (EN1600) lecture05 Sherief Reda Division of Engineering, Brown University Spring 2008 [sources: Weste/Addison Wesley]

  2. Summary of Terminology • body • diffusion (n/p) • source • drain • well • tap • contact • metal track • via • polysilicon gate length/width • gate oxide • channel • All these structures must obey the dimensions and separation rules dictated by the process fabrication facility

  3. Process design rules • Design rules change from fab to fab • Fab examples: IBM, Intel, TI, TSMC, UMC, MOSIS • Design rules change according to the process technology

  4. Lambda rules • Feature Size: minimum distance between source and drain of transistor • Feature size = 2λ (@ 90nm feature size λ=45) • According to Moore’s Law, how much does the feature size scale by every ~2 years?

  5. Design rules and gate layout • Lambda rules are conservative

  6. More design rules

  7. More and more design rules

  8. Inverters with taps

  9. Layout of a 3-input NAND gate

  10. Stick diagrams • No need to be drawn to scale

  11. Pitch of routing tracks

  12. Gate area estimation

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