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Development of 13.5 nm light source for nanolitography using plasma technologies. V. Sergeev, V. Kapralov, A. Kostryukov, I. Miroshnikov Plasma physics chair, Physical Technical Faculty G. Shneerson, Yu. Adamian High voltage techniques chair, Electomechanical Faculty

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development of 13 5 nm light source for nanolitography using plasma technologies
Development of 13.5 nm light source for nanolitography using plasma technologies

V. Sergeev, V. Kapralov, A. Kostryukov, I. Miroshnikov

Plasma physics chair, Physical Technical Faculty

G. Shneerson, Yu. Adamian

High voltage techniques chair, Electomechanical Faculty

State Polytechnical University

St. Petersburg

outline
Outline
  • Motivation
  • Laser plasma based on solid Xe rod
  • Laser plasma based on liquid droplet Xe jet
  • Plasma discharge based on theta-pinch approach
  • Summary
motivation
Motivation

Industry requirements for profitable EUV source:

  • Dimension – <1 mm
  • Radiation power onto mask

in (=13,5 nm, ) range – 130 W

Background:

  • Temperature of Xe plasma – 20-30 eV
  • Demonstrated power (in 2 st)

laser plasma – 2 W

  • Demonstrated power (in 2 st)

Z pinch plasma discharge – 150 W

slide4
Z-pinch source for 13.5 nanolitography From V.M. Borisov et al. Plasma physics report (2002) V. 28, No.10 pp.1-5
  • Merits:
  • Small radiation volume
  • Simplicity relative (to laser scheme)
  • Problems:
  • Erosion of electrodes (debris)
  • Heat removal
pinch source for 13 5 nanolitography
-pinch source for 13.5 nanolitography
  • Merits:
  • No erosion problem
  • Smoothed thermal load problem
  • Problems:
  • Larger radiation volume (mm range)
slide6

Continuous solid Xe rod extruded behind optical system and ignited by pulsed laser

Optical system for 13.2 nm lithography developed in Ioffe institute

Developed to detect extruded solid H2 rod

Light

barrier

Extruder of

solid Xe rod

Cryogenic

vessel

d~1 mm

Developed for tokamak plasma fuelling:

H2, Kr,

Excimer

laser

Laser

synchronization

slide7

Uniform droplet generation experiments

From Foster et al. Rev. Sci. Instrum., Vol. 48, No. 6, June 1977

100 μm

  • Liquid Hydrogen droplet generation:
  • V~100 m/sec; 70 μm droplets at 105/sec or 210 μm droplets at 2×104/sec :
  • Flow rate: 0.018 cm3/sec
  • For Xe doplets in EUV source is necessary:
  • 1μg/pulse×5×103pulse/sec=5×10-3g/sec
  • 5×10-3g/sec / 3.52 g/cm3=0.0015cm3/sec
slide8

Uniform series of liquid Xe droplets ignited by pulsed laser

Developed to detect pellet injected into tokamak

Light

barrier

Vibrating

nozzle

d~1 mm

Cryogenic

vessel

λ≥πdRaleigh instability

Developed for tokamak plasma fuelling:

H2, Kr,

Laser

synchronization

Excimer

laser

Optical system for 13.5 nm lithography developed in Ioffe institute

summary
Summary

Different ways of EUV source improvement have been considered

  • Theta-pinch approach has high radiation ower values (size of radiation area? require simulation and experimental verification)
  • Laser plasma based on solid Xe rod has technical simplicity (require experimental verification of absortion of laser power)
  • Laser plasma based on liquid droplet Xe jet seems mostly attractive way for development of the EUV source