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Scaling of MOS Circuits. EE213 VLSI Design. Scaling. VLSI technology is constantly evolving towards smaller line widths Reduced feature size generally leads to better / faster performance More gate / chip More accurate description of modern technology is ULSI (ultra large scale integration.

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scaling of mos circuits

Scaling of MOS Circuits

EE213 VLSI Design

scaling
Scaling
  • VLSI technology is constantly evolving towards smaller line widths
  • Reduced feature size generally leads to
    • better / faster performance
    • More gate / chip
  • More accurate description of modern technology is ULSI (ultra large scale integration
scaling factors
Scaling Factors
  • In our discussions we will consider 2 scaling factors, α and β
  • 1/ β is the scaling factor for VDD and oxide thickness D
  • 1/ α is scaling factor for all other linear dimensions
  • We will assume electric field is kept constant
scaling factors for device parameters
Scaling Factors for Device Parameters
  • Simple derivations showing the effects of scaling are derived in Pucknell and Eshraghian pages 125 - 129
  • It is important that you understand how the following parameters are effected by scaling
  • Gate Area
  • Gate Capacitance per unit area
  • Gate Capacitance
  • Charge in Channel
  • Channel Resistance
  • Transistor Delay
  • Maximum Operating Frequency
  • Transistor Current
  • Switching Energy
  • Power Dissipation Per Gate (Static and Dynamic)
  • Power Dissipation Per Unit Area
  • Power - Speed Product
scaling of interconnects
Scaling of Interconnects
  • Resistance of track R ~ L / wt
  • R (scaled) ~ (L / α) / ( (w/ α )* (t /α))
  • R(scaled) = αR
  • therefore resistance increases with scaling

A

t

w

L

B

scaling time constant
Scaling - Time Constant
  • Time constant of track connected to gate,
  • T = R * Cg
  • T(scaled) = α R * (β / α2) *Cg = (β / α) *R*Cg
  • Let β = α, therefore T is unscaled!
  • Therefore delays in tracks don’t reduce with scaling
  • Therefore as tracks get proportionately larger, effect gets worse
  • Cross talk between connections gets worse because of reduced spacing