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Modified Wakefield Tolerances for Undulator Vacuum Chamber

This article discusses the tolerances for undulator vacuum chamber roughness and its impact on wakefield amplitudes, lasing at different wavelengths, and energy spread.

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Modified Wakefield Tolerances for Undulator Vacuum Chamber

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  1. Undulator Physics IssuesHeinz-Dieter Nuhn, SLAC / LCLSJuly 11, 2007 • Modified Wakefield Tolerances for Undulator Vacuum Chamber 1

  2. Vacuum Chamber Update • Stainless steel has been disqualified as vacuum chamber material[See talk by Zack Wolf]. • Two aluminum designs with oval cross section are presently considered as replacement. • (A) SLAC: Clam Shell Aluminum Measured Roughness (rms slope): 25 mrad • (B) ANL: Extruded Aluminum Measured Roughness (rms slope): 60 mrad • Roughness measurements were performed on prototype chambers. They don’t presently quite make the roughness tolerance requirements of 10 mrad. • A third design is being considered as temporary backup solution for lasing at 15 Å • (C) Circular Copper Chamber with Roughness Tolerance set to 60 mrad 2

  3. Roughness Tolerance Specifications The factor in front of the roughness wakefield integral is proportional to the product of We use the rms slope to specify rougness tolerances: For a low values of the rms slope, the roughness wakefield amplitudes are reasonably well described by this quantity. 3

  4. Change of total Chamber Wakefield with rms slope The wakefield tolerances are chosen such that the resistive wall wakefield dominates the other wakefield components, including surface roughness and geometric wakefields. The requirement for the rms slope to be smaller than 10mrad satisfies that condition. Valid for 1 nC bunch The graph shows the sum over all wakefield contributions. 4

  5. Total Wakefield Profiles for Low Charge Bunch • Scenario “A” can be corrected by tapering adjustment. • Scenarios “B” and “C” will negatively impact lasing at short wavelength. A B C 5

  6. Total Wakefield Profiles for High Charge Pulse • Scenarios “B” and “C” will cause unacceptably large energy spread. Only small fraction along the bunch can be made to have gain, depending on the taper setting. A B C 6

  7. Tapering Ranges USEG33 USEG01 +6 mm Undulator Axis +2 mm Each LCLS Undulator is being tuned to a slightly different K value. Canted Pole Undulators can be horizontally repositioned (under remote control). Presently the field quality is being measured and recorded over range of ±6 mm. For a smaller range of ±2 mm tight tolerances on Field Integrals are in place. -2 mm -6 mm Spont. Rad. +Avg. Wake +Gain Boost +Post Sat. 7

  8. LCLS Undulator Module Pole Canting Canting comes from wedged spacers 4.5 mrad cant angle Gap can be adjusted by lateral displacement of wedges 1 mm shift means 4.5 µm in gap, or 8.2 G Beff can be adjusted to desired value 8

  9. Pole Center Line Vacuum Chamber First; K=3.5000; Dx=-4.0 mm Neutral; K=3.4881; Dx= 0.0 mm Neutral; K=3.4881; Dx= 0.0 mm Neutral; K=3.4881; Dx= 0.0 mm Roll-Away; K=0.0000; Dx=+80.0 mm Horizontal Slide Undulator Roll-Away and K Adjustment Function 9

  10. Measured Keff vs x for SN02 Undulator Fields are Measured and Recorded over ±6 mm range. Example: Keff 10

  11. Long Coil Vertical Field Integral Measurements for SN17 • Undulator field integrals are measured and recorded over ±6 mm range. • Tolerance of 40 µTm and 50 µTm2 are enforced over ±2 mm range but outside tolerance violations are generally small. 11

  12. Tapering Ranges Accommodate Low Charge Bunch USEG33 USEG01 +6 mm Undulator Axis +2 mm Each LCLS Undulator is being tuned to a slightly different K value. Canted Pole Undulators can be horizontally repositioned (under remote control). Presently the field quality is being measured and recorded over range of ±6 mm. For a smaller range of ±2 mm tight tolerances on Field Integrals are in place. -2 mm -6 mm Spont. Rad. +Avg. Wake +Gain Boost +Post Sat. 12

  13. Reduced Tolerances with Low Charge Bunch For Low Charge Bunch, average tapering requirements can be met for reduced tolerances when using extended tuning range. Scenario “A” (Al Clam Shell with 25 mrad roughness slope) is supported by the ±2 mm range for all wavelengths. B A C 13

  14. Reduced Tolerances with High Charge Bunch For High Charge Bunch, average tapering requirements can NOT be met for reduced tolerance scenarios “B” and “C” for all wavelengths. Scenario “A” is supported by the ±6 mm range for all wavelengths. B A C 14

  15. Tapering Scenarios (Overview) Average Core Loss Rates and Taper Requirements at 1.5 Å [Pretaper: -384 keV/m] Average Core Loss Rates and Taper Requirements at 15 Å [Pretaper: -122 keV/m] 15

  16. Core Energy Spread Increase Core Beam Energy Spread increases at 1.5 Å GENESIS Simulations see next slides Core Beam Energy Spread Increases at 15 Å 16

  17. GENESIS Simulation Results for Low Charge Bunch “C” at 15 Å Electron Energy: 4.31 GeV Radiation Wavelength: 15 Å Bunch Charge : 200 pC Using Wake Taper of 230 keV/m Tolerance Scenario: “C” Intensity Profile 15 Å Avg. Pulse Radiation Power vs. z Radiation Bandwidth vs. z 17 GENESIS Simulations by S. Reiche, UCLA

  18. GENESIS Simulation Results for Low Charge Bunch “B” at 1.5 Å Electron Energy: 13.64 GeV Radiation Wavelength: 1.5 Å Bunch Charge : 200 pC Using Wake Taper of 227 keV/m Tolerance Scenario: “B" Intensity Profile Avg. Pulse Radiation Power vs. z 1.5 Å Radiation Bandwidth vs. z 18 GENESIS Simulations by S. Reiche, UCLA

  19. Summary • Problems encountered with the Stainless Steel vacuum chamber design require the consideration of alternatives at reduced roughness tolerances. • Three cases have been identified with roughness levels 2.5 to 6 times above the original tolerances. • Wakefield calculations and GENESIS FEL simulations show that saturation for the full bunch can be achieved at long wavelengths for the full bunch and at short wavelength for parts of the bunch with appropriate taper selection at the 200 pC bunch charge. • Cases “B” and “C” should be considered marginal. They should be avoided for the long run. Case “A” is expected to provide acceptable performance. 19

  20. End of Presentation 20

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