Lithography ITWG Report ITRS Conference November 29, 2001 Santa Clara, CA. Lithography ITWG Chairmen. Outline. Lithography ITWG Report. Major changes from the 1999 ITRS. Lithography requirements. Difficult challenges. Potential solutions. Summary. s mask. s wafer =. N/MEF.
Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author.While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server.
November 29, 2001
Santa Clara, CA
N/MEFMajor changes from 1999
Final gate dimension (nm)
YearMicroprocessor Gate CDs
9 year acceleration!
EUV = extreme ultraviolet
EPL = electron projection lithography
ML2 = maskless lithography
IPL = ion projection lithography
PXL = proximity x-ray lithography
PEL = proximity electron lithography
Technologies shown in italics
have only single region support
Historical tool prices