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XAFS beam lines in Japan KEK PF NOMURA Masaharu

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XAFS beam lines in Japan KEK PF NOMURA Masaharu

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    1. XAFS beam lines in Japan KEK·PF NOMURA Masaharu 1. Overview of XAFS activity 2. Progress of XAFS beam line technology at PF 3. Progress of XAFS beam line technology at SPring-8 4. Key points for designing XAFS beam lines

    4. XAFS activities XAFS as a daily tool - transmission, fluorescence, CEY surface XAFS, total reflection XAFS fluorescent XAFS with MSSD towards ultra dilute systems utilization of soft X-ray micro XAFS With polarization control - MCD, NCD… time-resolved XAFS - quick, dispersive… site-resolved XAFS, state resolved XAFS

    5. Photon Factory BL-10B

    6. Photon Factory BL-12C Double crystal mono. + bent cylindrical mirror (Rh coat) Fluorescent XAFS with MSSD

    7. Photon Factory BL-9A New optics using bent conical mirrors. high flux with high energy resolution Control higher orders by using parallely aligned mirrors <10-6 , E>4keV) extension to SX

    8. SPring-8 BL01B1

    9. Wide energy range of BL01B1

    13. Beam line with focusing system ? Fluorescent XAFS with Lytle detector

    14. Multi-element SSD S/N = S/(S+B)1/2, S/B~1/200 Separation of fluorescent signal and scattering is the key. Thus require high energy resolution and high throughput

    15. Key points to design XAFS beam lines wide energy range (4(2.2) -- 23 keV or wider) Fairly high energy resolution (~10-4) simple beam line optics fixed, fairly small focused beam negligible higher order content (<10-4) mirror (lower E), detune (higher E) various detection modes transmission, fluorescent detection, CEY wide space for sample attachments cryocooler, furnace etc. Nearby chemistry lab., exhaust handling

    16. ?X???????

    17. MoS2?XAFS

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