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LCLS Undulator Vacuum Chamber Design. Soon-Hong Lee Advanced Photon Source. CDR Vacuum Chamber Requirements. – Small Vertical Aperture (5 mm) and Thin wall (<0.5 mm) External Dimension: 6 mm OD x 3.42 m long (to fit within a 6.35 mm gap)

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lcls undulator vacuum chamber design

LCLS Undulator Vacuum Chamber Design

Soon-Hong Lee

Advanced Photon Source

slide2

CDR Vacuum Chamber Requirements

  • – Small Vertical Aperture (5 mm) and Thin wall (<0.5 mm)
  • External Dimension: 6 mm OD x 3.42 m long (to fit within a 6.35 mm gap)
  • – Stable Geometry (No Vacuum deformation)
  • – High Conductivity Inner Surface
  • To minimize the electric resistive wake-field effects
  • – Low Surface roughness, Ra < 100 nm (h: ~100 nm, g: ~100 m)
  • To minimize the surface roughness wake-field effects
  • –High Melting Temperature
  • To survive during direct primary beam exposure
  • – Low Pressure and Low out-gassing rate (pumping only in undulator gap)
slide4

Vacuum Chamber Design I – Tube option

  • Concept I
  • Ni-Coating to mirror-finished SS 316L Tube and E.P.
  • Cu-coating and E.P.
  • E-Beam welding to SS horizontal support plate
  • TIG welding to strong-back vertical plate (or Clamping using fasteners)
  • Concept II
  • Electro-polishing of OFHC Cu Tube (As-drawn tube)
  • E-Beam tack welding to Cu plate
  • Brazing to SS horizontal support plate
  • TIG welding to strong-back vertical plate (or Clamping using fasteners)
slide5

Vacuum Chamber Design II – Box Option

  • Concept I
  • Machining 4-mm thick plates for beam aperture opening
  • Eletropolishing & Cu-Coating
  • E-Beam welding at both sides
  • E-Beam to SS horizontal plate
  • TIG welding to strong-back vertical plate (or Clamping using fasteners)
  • Concept II
  • Machining 8-mm thick plates for welding seats
  • Bend SS mirror-finished strip
  • Cu-coating to bended strip and E.P.
  • E-Beam welding to machined plate
  • TIG welding to strong-back vertical plate (or Clamping using fasteners)
slide8

Vacuum Chamber Development – Box option

  • Stress Analysis

Aperture

Maximum Displacement

Maximum Stress

Remarks

10 mm (H) x 5 mm (V) – Strip

0.52 m

8.15MPa

Small aperture

6 mm

15 mm (H) x 5 mm (V) – Strip

5.86 m

41.7MPa

Acceptable

25 mm

20 mm (H) x 5 mm (V) – Strip

19.2 m

106.4 MPa

Out of criteria

20 mm (H) x 5 mm (V) aperture – Strip type

Maximum Displacement: 19.2 m Maximum Stress: 106.4MPa

10 mm (H) x 5 mm (V) aperture- Strip type

Maximum Displacement: 0.52 m Maximum Stress: 8.15MPa

10 mm (H) x 5 mm (V) – U-profile

2.22 m

35.8MPa

Small aperture

12 mm (H) x 5 mm (V) – U-profile

3.72 m

42.1MPa

Acceptable

15 mm(H) x 5 mm (V) – U-profile

9.40 m

84.2MPa

Out of criteria

20 mm (H) x 5 mm (V) – U-profile

27.3 m

115.7MPa

Out of criteria

6 mm

20 mm

Criteria

- Maximum Displacement < 10 m (?)

- Maximum Stress < 69MPa

(Safety factor w.r.t. yield stress: 3.0)

slide9

6 mm

~102.5 mm

15 mm (H) x 5 mm (V) aperture – Strip type

Maximum Displacement: 7.60 m Maximum Stress: 59.9MPa

Global Sensitivity Study

Max. von Mises stress vs. horizontal aperture / Max. displacement vs. horizontal aperture

69 MPa

10 m

16.7 mm

16.5 mm

  • Global Sensitivity to horizontal aperture size
slide10

15 mm (H) x 5 mm (V) aperture – Strip with Strong-back Support

Maximum Displacement: 18.88 m Maximum Stress: 48.3MPa

Applied Loads & Constaints

3D –ProMechanica Model

  • Vacuum Chamber Analysis – Support structure
slide11

4 x E-Beam

UHV Welding

Leak Check

I

Prototype II

Prototype I

8 mm  0.2

6 mm  0.1

Machining Both Surfaces

Cu-Coated on mirror-finished SS 316L strips (1.5 mm thick)

Cu-Cu E-beam Tack Welding

Cu-SS Brazing

SS316L

OFHC Cu

II

  • Vacuum Chamber Prototypes