1 / 23

Four Point Probe and Hall measurement

Four Point Probe and Hall measurement. Adviser : Kuen-Hsien Wu Student : Wei-Ming Lin. Outline. 1. Introduction. 2 . Principle. 3. Operation. 4. Conclusions. 5. References. Introduction.

Download Presentation

Four Point Probe and Hall measurement

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript


  1. Four Point Probe and Hall measurement Adviser:Kuen-Hsien Wu Student:Wei-Ming Lin

  2. Outline 1.Introduction 2. Principle 3. Operation 4. Conclusions 5. References

  3. Introduction Four-point probe measurement instrument mainly used for measuring the resistance of semiconductor thin films, that sheet resistance. Sheet resistanceis one of the important characteristics of a conductive material, particularly a conductive film. Sheet resistance will be the film thickness、grain size Inch and the impurity concentration and other factors. Therefore, in the course of the process, often carefully monitor sheet resistance .

  4. Principle I ρ=V/I.W .CF Rs = V/I .CF Asd/s>20 → CF~4.54 V W S S S sample d

  5. Operation 四點探針機台

  6. Operation 上機台輸入固定電流 下機台量測出電壓

  7. Operation 橫桿下拉 sample

  8. Operation 藍點要恆亮 Rs = 4.54 V/I 0.154767mV/1 μ A × 4.54 =701Ω

  9. Conclusions 1 Sample size and shape does not affect the measurement results, therefore, the sample does not have to make special specifications . 2 Four-point probe measurements silicon wafer with a metal film sheet resistancethe most common method. 3 Simple and fast, but more troublesome problem is to calculation results .

  10. Introduction In 1978, Edwin H.Hall input current in theconductor applied magnetic field. Conductor and the current direction the ends of the vertical , can measure the induced voltage . Can determine the polarity and concentration of carriers , Known as the Hall effect .

  11. Principle Z F= qVxBz Bz X qεy = qVxBz εy = VxBz y VH= εyW + p-type VH - εx εy W Vx 正 P-type 負 n-type + - ρ =RH /μp

  12. Operation

  13. Operation 將sample固定在量測基板上

  14. Operation 將量測基板插入量測架上

  15. Operation 在量測座上放磁石並進行量測

  16. Operation 開啟量測軟體

  17. Operation 出現霍爾量測系統畫面

  18. Operation 輸入膜厚

  19. Operation 得到data

  20. Hall measurements VS.Four-point probe

  21. Conclusions 1 Hall effect is mainly for detecting a semiconductor material,film samples can be measured resistivity, carrier concentration, carrier polarity, and mobility. 2 Rapid measurement , Simple operation, simple to operate a computer, you can complete the measurement step , the film is detected with a great help.

  22. References http://140.116.176.21/www/technique/SOP/SOP%204-Point%20Probe.pdf四點探針儀器介紹 http://ezphysics.nchu.edu.tw/prophys/basicexp/expnote/hall/hall_97Feb.pdf物理實驗-霍爾效應 http://mast-tech.com.tw/Resistivity%20Measurement.pdf 科豐國際有限公司

  23. Thank You

More Related