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Electron Beam Lithography System - ELF 10000

The ELF-10000 enables full 8-inch wafer size fabrications of nanoimprint molds within 24 hours. Schedule a product demo with an expert today!<br>

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Electron Beam Lithography System - ELF 10000

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  1. ELF-10000 sts-elionix.com/product/elf-10000/ *Brochure will be sent to the email entered Name Email Business Consent* I am not robot* *Brochure will be sent to the email entered Name Email Business 1/3

  2. Consent* I am not robot* *Brochure will be sent to the email entered Name Email Business Consent* I am not robot* *Brochure will be sent to the email entered Name Email Business Consent* I am not robot* *Brochure will be sent to the email entered Name Email Business Consent* I am not robot* Key Features: Largest beam current – 1uA Fastest clock speed – 400MHz Largest field size – 10mm square Drastically reduces number of stitching boundaries 2/3

  3. *Brochure will be sent to the email entered Name Email Business * I am not robot* Surpassing conventional microfabrication systems in throughput The ELF-10000 enables full 8-inch wafer size fabrications of nanoimprint molds within 24 hours. From production in nanoimprint technology to high-mix, low-volume production, the ELF-10000 is perfect for the large fabrication write fields of laser fabrication and machining fabrication. Download Brochure Inquiries 3/3

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