Sensor Technology group

1. Sensor Technology group • Read-out Electronics for Pixel Detectors • Establishment of Experimental Research Infrastructure Departement of Information Technology and Media Sensor Technology

2. Establishment of Experimental Research Infrastructure • Introduction • Purpose • Establishment of experimental research infrastructure in processing of semiconductor radiation detectors • Educate undergraduate and graduate student in basic semiconductor processing • Support the simulation group with samples-test structures for measuring different kind of semiconductor parameters • Requirement • The equipment in the clean room must be easy to use and be as flexible as possible • The equipment must handle small pieces, to wafers with a diameter of 100mm • The most common processing steps must be represented Departement of Information Technology and Media Sensor Technology

3. Overview of the cleanroom Departement of Information Technology and Media Sensor Technology

4. Outside the cleanroom • Infrastructure • Gas store rooms • Storage for chemicals • Deionised Water • Ventilation • Control of: • Particles • Temperature • Humidity • Exhaust • Drainage of acids and solvents • Vacuum (for wafer chuck) • Cooling water • Compressed air Departement of Information Technology and Media Sensor Technology

5. Change to cleanroom clothes Measurement laboratory Inside the cleanroom Departement of Information Technology and Media Sensor Technology

6. Dry etch (RIE) • Electrode distance • Etching chemistry • SF6, CH4, CHF3 • Pressure • Bias • Power • Tegal 903e • Tegal 901e Departement of Information Technology and Media Sensor Technology

7. Furnaces • Diffusion from solid sources • Boron • Phosphorus • Growth of silicondioxide • dry • wet (pyrogenic) • Annealing • FGA N2/H2 • in N2 or O2 ambient Departement of Information Technology and Media Sensor Technology

8. Wet etching • Cleaning • R/D • Anisotropic wet etch Departement of Information Technology and Media Sensor Technology

9. Lithographic Processes • Mask aligner • Soft contact • Proximity • Plasma stripper • Development bench • Softbake furnace • Hardbake furnace • Hotplate • Spinner • HMDS furnace • Place for maskgenerator Departement of Information Technology and Media Sensor Technology

10. Implantation • Varian DF4 • Energy 10 keV-200 keV • BF3 (gas) • Arsenic (Solid) • Phosphorus (Solid) Departement of Information Technology and Media Sensor Technology

11. Metallization • Sputter • Electron beam evaporator (to be delivered in august) • Six pocket crucible • High voltage power supply fully semiconductor equipped Departement of Information Technology and Media Sensor Technology

12. Education Course in “Vacuum Technology for Semiconductor Processing” (Given by Doc. Lars Westerberg, chairmen in Swedish Vacuum Society) Lectures Laboratory exercise Study visit at The Svedberg laboratory in Uppsala Planned Project Pixel detector in silicon Integrated DE-E detector in silicon UV-detector in silicon with two layers antireflective coating Quadrant detector in silicon Test structures in SiC Laboratory exercise for the students in the processing of pn-diodes Recruit of PHD students to work in semiconductor processing Departement of Information Technology and Media Sensor Technology