Block Copolymer Micelle Nanolithography Roman Glass, Martin Moller and Joachim P Spatz University of Heidelberg IOP Nanotechnology (2003). Erika Parra EE235 4/18/2007. Motivation. Market Trends Small features Sub-10nm clusters deposited Patterns 50nm to 250nm and greater
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Block Copolymer Micelle NanolithographyRoman Glass, Martin Mollerand Joachim P SpatzUniversity of HeidelbergIOP Nanotechnology (2003)
Side view TEM – treated wafer
Au ~ HAuCl4
D = 8nm, L = 85nm
Micelles as masks for diamond field emitters
F. Weigl et al. / Diamond & Related Materials 15 (2006)