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Top-down technique

Top-down technique. Toshitake Takahashi 03/09/2009 EE235. Demonstrate a new method to fabricate single fluidic-channel of uniform channel width (11-50nm) and over 1.5cm in length Imprint mold is created by unconventional nanofabrication (crystallographic anisotropic etching…). Overview.

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Top-down technique

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  1. Top-down technique ToshitakeTakahashi 03/09/2009 EE235

  2. Demonstrate a new method to fabricate single fluidic-channel of uniform channel width (11-50nm) and over 1.5cm in length • Imprint mold is created by unconventional nanofabrication (crystallographic anisotropic etching…)

  3. Overview (a) Innovative mold fabrication that creates a nanoimprint mold (b) Use of the mold to imprint the nanochannel line in a functional material layer (c) Optical RIE that transferres the imprinted patterns into a substrate

  4. Schematic of fabrication steps for making imprint mold Anisotropic wet etching with KOH Atomically smooth sidewall • Conformal deposition of SiNx • ensure uniform channel width • Channel width is defined by SiNx film thickness

  5. SEM images of each step

  6. Top-down SEM images of 17nm, 1.5cm long channel • Uniform over the entire • channel • Offer sub-10nm lithographic • resolution for patterning • sub-20nm channel line

  7. Channel continuity tests (1) Flowing colored water (2) Flowing DNA in solution DI water containing fluorescent dye (2) DNA labeled with TOTO-1 fluorescent dye

  8. Electrical conductance measurement Microchannel • With a salt solution, electrical • conductance : Gm=66.1 nS • Electrical conductivity is • σ=GmL/wd=10.2 S/m Nanochannel • Electrical conductance : Gm=0.40 pS • channel cross-section: 314 nm2 • =(17.7 nm×17.7 nm)

  9. Conclusion • Demonstrate the fabrication of a single, narrow • (as small as 11nm), long (over 1.5cm) and continuous • fluidic channel • This technique can be used for a variety of innovative • bio/chemical sensors, particullary single-stranded DNA • sequencing device

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