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Quantum corrected full-band Cellular Monte Carlo simulation of AlGaN/GaN HEMTs †

Quantum corrected full-band Cellular Monte Carlo simulation of AlGaN/GaN HEMTs †. Shinya Yamakawa, Stephen Goodnick *Shela Aboud, and **Marco Saraniti Department of Electrical Engineering, Arizona State University *Electrical Engineering Department, Worcester Polytechnic Institute

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Quantum corrected full-band Cellular Monte Carlo simulation of AlGaN/GaN HEMTs †

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  1. Quantum corrected full-band Cellular Monte Carlo simulation of AlGaN/GaN HEMTs† Shinya Yamakawa, Stephen Goodnick *Shela Aboud, and **Marco Saraniti Department of Electrical Engineering, Arizona State University *Electrical Engineering Department, Worcester Polytechnic Institute **Department of Electrical and Computer Engineering, Illinois Institute of Technology USA †This work has been supported by ONR, NSF, and HPTi.

  2. Motivation and Approach • AlGaN/GaN HEMT is the attractive candidate for high-temperature, high-power and high-frequency device. • wide band gap, high saturation velocity • high electron density by spontaneous and piezoelectric polarization effect • Here the full-band Cellular Monte Carlo (CMC) approach is applied to HEMT modeling. • The effect of the quantum corrections is examined based on the effective potential method.

  3. Full-band transport model • Transport is based on the full electronic and lattice dynamical properties of Wurtzite GaN: • Full-band structure • Full Phonon dispersion • Anisotropic deformation potential scattering (Rigid pseudo-ion Model) • Anisotropic polar optical phonon scattering (LO- and TO-like mode phonons) • Crystal dislocation scattering • Ionized impurity scattering • Piezoelectric scattering

  4. Tensile strain PSP PPE AlGaN + 2DEG PSP GaN AlGaN/GaN hetero structure Ga-face (Ga-polarity) 2DEG PSP : Spontaneous polarization PPE : Piezoelectric polarization (strain) Fixed polarization charge is induced at the AlGaN/GaN interface P0 AlGaN Tensile strain GaN Ambacher et al., J. Appl. Phys.87, 334 (2000)

  5. Classical potential (from Poisson’s equation) Effective potential approximation Quantization energy Charge set-back Effective potential approach Smoothed Effective Potential Effective potential takes into account the natural non-zero size of an electron wave packet in the quantized system. This effective potential is related to the self-consistent Hartree potential obtained from Poisson’s equation. a0 : Gaussian smoothing parameter • depends on • Temperature • Concentration • Confining potential • Other interactions D.K. Ferry, Superlattices and Microstructures 28, 419 (2000)

  6. Gate AlxGa1-xN Doped 15 nm AlxGa1-xN Spacer 5 nm GaN 100 nm Schrödinger-Poisson calculation Calculated AlGaN/GaN structure Schrödinger-Poisson (S-P) calculation Al0.2Ga0.8N/GaN Modulation doping : 1018 cm-3 Unintentional doping : 1017 cm-3 (for AlGaN and GaN) Al content x : 0.2  0.4 F. Sacconi et al., IEEE Trans. Electron Devices48, 450 (2001)

  7. Effective potential calculation Quantum correction (QC) with effective potential • Solve Poisson equation with classical electron distribution • Quantum correction with the effective potential method • Calculate the electron density with the new potential (Fermi-Dirac statistics) • Solve the Poisson equation Self-consistent calculation : Al0.2Ga0.8N/GaN Repeat until convergence The final effective potential shifts due to the polarization charge

  8. Electron distribution Electron distribution for S-P, classical and quantum correction (Al0.2Ga0.8N/GaN) Quantum correction (initial) Quantum correction (self-consistent) a0 (Å) : Gaussian smoothing parameter

  9. Electron sheet density Ns for Si MOSFET Ns for AlGaN/GaN HEMT Al0.2Ga0.8N/GaN MOSFET with 6nm gate oxide. Substrate doping is 1017 and 1018 cm-3. MOSFET data: I. Knezevic et al.,IEEE Trans. Electron Devices49, 1019 (2002)

  10. Comparison of electron distribution with S-P Al0.2Ga0.8N/GaN Al0.4Ga0.6N/GaN

  11. Gaussian smoothing parameter (a0) fitting

  12. HEMT device simulation Electron distribution under the gate Simulated HEMT device Classical Quantum correction UID density : 1017 cm-3 Ec = 0.33 eV Schottky barrier B=1.2eV a0=6.4 Å

  13. Effective potential Classical VG=0V VDS=6V

  14. ID_VDS, ID_VG

  15. Conclusion • The effect of quantum corrections to the classical charge distribution at the AlGaN/GaN interface are examined. The self-consistent effective potential method gives good agreement with S-P solution. • The best fit Gaussian parameters are obtained for different Al contents and gate biases. • The effective potential method is coupled with a full-band CMC simulator for a GaN/AlGaN HEMT. • The charge set-back from the interface is clearly observed. However, the overall current of the device is close to the classical solution due to the dominance of polarization charge.

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