Photoresist Characterization. Spin Speed vs. Thickness Nate Hamm, Steve Kelly, Brian MacFarland, John Yarbrough, Jeff Flint. Introduction. Photolithography is an important procedure in semiconductor processing For our processes in the lab, having the proper thickness coating is essential
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Spin Speed vs. Thickness
Nate Hamm, Steve Kelly, Brian MacFarland, John Yarbrough, Jeff Flint
3000 rpm 5000 rpm
3500 rpm 5500 rpm
4500 rpm 6000 rpm