'Positive resist' presentation slideshows

Chapter 3 Materials and Basic Processes

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IC ???????? ???

IC ???????? ???. PHOTOLITHOGRAPHY ??. ????. 1. General 2. Facility ( ???? ) 3. Mask ( ??? ) 4. Process step highlight ( ?????? ) 5. BCD ???? 6. History and ???????. 1. General. MASKING Process ( ???? ) Photolithography ( ???? ) ----Transfer a temporary pattern (resist)

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Section 2: Lithography

Section 2: Lithography. Jaeger Chapter 2. The lithographic process. Substrate covered with silicon dioxide barrier layer Positive photoresist applied to wafer surface Mask in close proximity to surface Substrate following resist exposure and development

1.38k views • 47 slides

Electron beam lithography (EBL)

Electron beam lithography (EBL). Overview and resolution limit. Electron source (thermionic and field emission). Electron optics (electrostatic and magnetic lens). Aberrations (spherical, chromatic, diffraction, astigmation). EBL systems (raster/vector scan, round/shaped beam).

1.38k views • 47 slides

Microelectronics 2

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Zarelab Guide to Microfluidic Lithography

Zarelab Guide to Microfluidic Lithography. Author: Eric Hall, 02/03/09. Introduction. The process through which we make microfluidic chips is called lithography . This presentation is an introduction to how we do lithography in the Zarelab.

458 views • 29 slides