'Optical proximity correction' presentation slideshows

Photolithography and resolution enhancement techniques (RET)

Photolithography and resolution enhancement techniques (RET). Photolithography and resolution limit Immersion lithography Off-axis illumination (OAI) Phase-shift mask (PSM) Optical proximity correction (OPC) Double processing.

1.53k views • 49 slides

1.19k views • 24 slides

Effect of Resist Thickness

Effect of Resist Thickness. Resists usually do not have uniform thickness on the wafer Edge bead: The build-up of resist along the circumference of the wafer - There are edge bead removal systems Step coverage. Centrifugal Force. Effect of Resist Thickness.

511 views • 13 slides