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Double resist resist - PowerPoint PPT Presentation

Pattern transfer by etching or lift-off processes

Pattern transfer by etching or lift-off processes. Basic pattern transfer steps. Positive resist (~1 m m thick) Film substrate. Hard mask. UV light. Glass opaque pattern. Film etching. Exposure. development. Resist stripping. Unexposed resist removed by resist striper.

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Double resist resist - PowerPoint PPT Presentation

Pattern transfer by etching or lift-off processes