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1 . T itle : P rotection schemes for EUVL masks against particle contamination

SEMINAR. 1 . T itle : P rotection schemes for EUVL masks against particle contamination 2. S peaker : Professor Jung Hyeun Kim (University of Seoul) 3. T ime : 1 6 :00 – 17:30, Thursday, May 03, 2007

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1 . T itle : P rotection schemes for EUVL masks against particle contamination

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  1. SEMINAR 1. Title : Protection schemes for EUVL masks against particle contamination 2. Speaker : Professor Jung Hyeun Kim (University of Seoul) 3. Time : 16:00 – 17:30, Thursday, May 03, 2007 4. Place : e+ Lecture Hall (room 83188), 2nd Research Building, Sungkyunkwan University 5. Summary : Extreme Ultraviolet Lithography (EUVL) is a leading lithography technology for the next generation of semiconductor chips. Due to the lack of any usable common membrane pellicles, different approaches have to be considered in order to protect the reflective EUV photomasks (6” x 6” x 0.25” / 150 mm x 150 mm x 6.4 mm, based on low thermal expansion substratefrom harmful particle contamination. In common lithography systems, a pellicle, i.e. a thin transparent membrane was used to seal off a transmitting photomask from particle deposition. However, these pellicles would absorb the EUV beam too much and can therefore not be used to protect EUVL masks. Novel absorption free protection methods are thus required. In this talk, particle protection schemes are presented through experimental demonstrations during pump-down process and actual process environment. Analytical model to estimate the particle stopping under low pressure conditions will also be shown with several model calculations. 6 Background : Education 1992 Chemical Engineering, POSTECH, B.S 1994 Chemical Engineering, SNU, M.S 2003 Chemical Engineering, University of Maryland at College Park, Ph.D Work Experience 1994-1999 LG Chemical Research Park, Engineering Plastic Division 2000-2003 Guest Researcher, Physics Laboratory/ NIST - Scattering Metrology & Nanoparticle Synthesis 2003-2006 Research Associate, Particle Technology Laboratory/ U. MN - Slip Correction Factor - Protection Schemes for EUVL masks under Vacuum 2006- Assistant Professor, Chemical Engineering, University of Seoul - Nanosystem Application Laboratory 7. Questions : Professor Jung Hyeun Kim (☏ 02-2210-5714) Sungkyunkwan University

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