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Novel Method of Surface Activation for Electroless Metal Plating

Novel Method of Surface Activation for Electroless Metal Plating. Jon Englert 1 , Amy Ng 2 , and Anthony Muscat 3 1 Department of Chemistry and Biochemistry, 2 Department of Materials Science and Engineering, 3 Department of Chemical and Environmental Engineering, University of Arizona

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Novel Method of Surface Activation for Electroless Metal Plating

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  1. Novel Method of Surface Activation for Electroless Metal Plating Jon Englert1, Amy Ng2, and Anthony Muscat3 1Department of Chemistry and Biochemistry, 2Department of Materials Science and Engineering, 3Department of Chemical and Environmental Engineering, University of Arizona Arizona Space Grant Consortium, Tucson, Arizona April 17, 2010

  2. Metal Plating • Corrosion and Wear Resistance • Physical Properties • Conductivity Characteristics • Lam Research: Wire Production

  3. Electroless Metal Plating Process: Deposit a thin chemical layer on an object that can catalyze the nucleation of metal on its surface • No electrical power required • Plating on nonconductive surfaces • Uniform plating on complex substrates

  4. Surface Activation for Electroless Metal Plating Challenge: Saturated monolayer required for uniform plating Approach: Aminosilane self assembled monolayer (SAM) on SiO2 substrate to form a reactive amino-terminated surface 3-aminopropyltrimethoxysilane APTMS Tri-functional aminosilane SiO2

  5. Common Surface Activation Methods Liquid: Exposure to aminosilane solution and extraction with solvents Dilute Liquid: Exposure to highly diluted aminosilane in solvents Atmospheric Vapor: Exposure to aminosilane at atmospheric vapor and extraction with solvents [1] Petri D.F.; Wenz G.; Shunk P.; Schimmel T. Langmuir 1999, 15, 4520-4523.

  6. Common Surface Activation Methods

  7. Vacuum Vapor Method Samples are placed in the vacuum vapor reactor and pumped down Pump valve is closed and samples are exposed to precursor vapor System is purged of precursor vapor and the sample is removed • Fast deposition with less thickness variation • No precursor dilution required • Can be combined with vacuum controlled etching and plating processes

  8. APTMS Vacuum Vapor Exposure

  9. Comparison of Activation Methods

  10. APTMS Surface Characterization Water contact angle on an amino-terminated surface is approximately 50⁰-70⁰ 1 [1] Petri D.F.; Wenz G.; Shunk P.; Schimmel T. Langmuir 1999, 15, 4520-4523.

  11. APTMS Exposure and Extraction • Other Solvents Used: • Acetone • Isopropyl Alcohol • Chloroform One cycle is one exposure and one extraction 11

  12. APTMS Surface Characterization Amino-terminated surface present throughout process suggesting polymerization

  13. APTMS Surface Characterization X-Ray Photoelectron Spectroscopy (XPS) Analysis S1 = 6 cycles of 10min APTMS Exposure / 10min Toluene Extraction S3 = 10min APTMS Exposure

  14. Current Work • Atomic Force Microscopy (AFM) and Fourier Transform Infrared Spectroscopy (FTIR) of activated surfaces. • Cobalt plating on activated surfaces • Surface activation using APDES precursor 3-aminopropyldimethylethoxysilane APDES Mono-functionalized aminosilane

  15. Thank You!

  16. Vacuum Vapor Reactor Schematic

  17. APDES Vacuum Vapor Exposure

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