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Surface Diffusion and Elasticity in SiGe Heterostructures: Continuum Approach

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Surface Diffusion and Elasticity in SiGe Heterostructures: Continuum Approach

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    1. Surface Diffusion and Elasticity in SiGe Heterostructures: Continuum Approach Martin Burger UCLA

    2. Quantum Dot Growth

    3. SiGe Heterostructures Basic mechanism of growth: Asaro-Grinfeld-Tiller instability Lattice mismatch (4,2 %) causes misfit strain - reliefed by surface roughening

    4. SiGe Heterostructures

    5. PbSe/PbEuTe Heterostructures

    6. InAs/InGaAs/GaAs Heterostructures

    7. Equilibrium Shapes

    8. Continuum Model

    9. Chemical Potential Chemical potential is determined by energy gradient:

    10. Surface Diffusion

    11. Equation for Film Height

    12. Numerical Simulation Supplemented by usual boundary conditions Supplemented by usual boundary conditions

    13. Numerical Solution, 2 D

    14. Simulation, 2 D

    15. Simulation, 2 D

    16. Simulation, 2 D

    17. Simulation, 2 D

    18. Simulation, 2 D

    19. Simulation, 2 D

    20. Numerical Solution, 3 D

    21. Simulation, 3 D

    22. Numerical Solution, 3 D

    23. Intermixing Effects

    24. Dynamic Intermixing

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