1 / 9

Plasmonic Nanolithography

Plasmonic Nanolithography. EE235 Nanofabrication Jie Yao April 16, 2007. W. Srituravanich, et al, Nano. Lett. 4, 1085 (2004). 2 um. Z. Liu, et al, Nano. Lett. 5, 957, (2005). Light. Surface Plasmons. Higher resolution lithography. Plasmonic Lithography. Plasmonic Nanolithography.

isleen
Download Presentation

Plasmonic Nanolithography

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript


  1. Plasmonic Nanolithography EE235 Nanofabrication Jie Yao April 16, 2007

  2. W. Srituravanich, et al, Nano. Lett. 4, 1085 (2004) 2 um Z. Liu, et al, Nano. Lett. 5, 957, (2005)

  3. Light Surface Plasmons Higher resolution lithography Plasmonic Lithography Plasmonic Nanolithography Surface plasmons (SPs) are collective free electron oscillations at a metal/dielectric interface Main features of SPs • Shorter wavelength • (comparing with excitation light) • Evanescent wave enhancement • Bond to the surface • Propagation along the surface H. Raether, Surface Plasmons, (1988).

  4. Hole array lithography W. Srituravanich, et al, Nano. Lett. 4, 1085 (2004)

  5. Glass Al |E| PR substrate Surface Plasmon Interference Surface Plasmon Interference Nanolithography (SPIN) Z. Liu, et al, Nano. Lett. 5, 957, (2005)

  6. (b) Photoresist Al Quartz (c) 0.5 Al 0 2 um Lithography Results (1D) (a) λ0=365nm (d) Photoresist Al Quartz (e) 2 um Period ~115 nm

  7. 3μm (b) (a) μm (nm) 8 ~118nm 6 4 2 (c) μm Lithography Results ~60nm Low reflectivity from the slit  slit distance doesn’t affect the pattern quality

  8. (d) (c) (b) (a) (d’) (c’) (b’) (a’) (c) 2D SP Interference Lithography • The interference pattern is determined by the arrangement of the SP sources • The resolution is determined by the SP wavelength

  9. Thank youQuestions?

More Related