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Metrology ITWG Report

Metrology ITWG Report. 2002 Changes. Litho Metrology Change basis of CD Precision to Litho process variance on printed gate. Precision is even more difficult to achieve Add better discussion of why red (new color) LER is now off-line Interconnect

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Metrology ITWG Report

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  1. Metrology ITWG Report

  2. 2002 Changes • Litho Metrology • Change basis of CD Precision to Litho process variance on printed gate. Precision is even more difficult to achieve • Add better discussion of why red (new color) • LER is now off-line • Interconnect • Better define copper void and low k pore measurement needs in Interconnect Metrology Tech Requirements Table • Push red out based on testing of methods

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