1 / 2

Metrology ITWG Report

Metrology ITWG Report. 2002 Changes. Litho Metrology Change basis of CD Precision to Litho process variance on printed gate. Precision is even more difficult to achieve Add better discussion of why red (new color) LER is now off-line Interconnect

hagop
Download Presentation

Metrology ITWG Report

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript


  1. Metrology ITWG Report

  2. 2002 Changes • Litho Metrology • Change basis of CD Precision to Litho process variance on printed gate. Precision is even more difficult to achieve • Add better discussion of why red (new color) • LER is now off-line • Interconnect • Better define copper void and low k pore measurement needs in Interconnect Metrology Tech Requirements Table • Push red out based on testing of methods

More Related