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Investigation of Ferroelectric Nanodots for Memory Applications - PowerPoint PPT Presentation

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Response. Investigation of Ferroelectric Nanodots for Memory Applications. Timothy A. Morgan, Zhaoquan Zeng , Greg Salamo. Bias. Motivation & Approach. Substrate Selection & Preparation. Characterization & Results.

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Investigation of Ferroelectric Nanodots for Memory Applications

Timothy A. Morgan, ZhaoquanZeng, Greg Salamo


Motivation & Approach

Substrate Selection & Preparation

Characterization & Results

Ferroelectric nanoscale dots are attractive due to their small size and therefore high memory density based on hysteresis that could result in a “on-chip” hard drive. In addition ferroelectric based memory has advantages in data retention, power reduction and quicker access times.

Examining commercially available substrates for appropriate mismatch is necessary. Understanding every substrate’s crystal structure and symmetry is essential in understanding what plane is required to grow on. The goal is finding a cubic or tetragonal unit cell with a lattice parameter having a ~5-7% mismatch.

  • Initial growths show dots on MgO, YAlO3 (YAO) and LaAlO3 (LAO)

  • MgOsubstrate surface roughness is minimized at annealing temperature of 850 C for 12 hours with oxygen flow

  • Growths on smoother MgO surface have yet to show dots

  • Dots have formed on unprepared MgO

  • XPS results of dot sample confirm BTO formed


YAlO3 (220)

LaAlO3 (110)


BTO on YAlO3

Our nanoscale ferroelectric dots will be fabricated by self-assembly due to strain built up from a lattice mismatch between the substrate and barium titanate (BTO) deposited by molecular beam epitaxy (MBE). Dots form due to either compressive (negative mismatch) and tensile (positive mismatch) strain as shown below.

  • Future

  • Investigate MgO surface characteristics that are optimal for BTO dot formation

  • Investigate LAO substrates for dot growth

  • Optimize growth conditions for consistent dot formation

  • Investigate composition of individual nanodots


MgO @ 700° C 12 hrs

BTO on MgO






MgO @ 850° C 12 hrs

MBE growth is accomplished using a Shuttered RHEED Techniquethat produces alternating layers of AO & BO2 which is monitored by diffraction as shown below

Obtainining an atomically flat surface on our substrate is our goal. We have worked on preparing MgO through annealing with oxygen flow.

  • Acknowledgements

  • Rob Sleezer

  • David Monk

  • Morgan Ware


MgO @ 1100° C 12 hrs

  • BTO on MgO Composition analyisis

  • Ba, Ti & O peaks found on surface

  • No substrate impurities found

STO (100) substrate

BaO layer on STO (100)

TiO2 layer on STO (100)