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Assessing Mechanisms Responsible for Non-Homogenous Emitter Electrospray from Large Arrays of FEEP and Colloid Thruste

Assessing Mechanisms Responsible for Non-Homogenous Emitter Electrospray from Large Arrays of FEEP and Colloid Thrusters. Emitter Operation. liquid metal ion – FEEP Thruster atomic ions relatively large electric field high efficiency liquid metals do not wet Si.

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Assessing Mechanisms Responsible for Non-Homogenous Emitter Electrospray from Large Arrays of FEEP and Colloid Thruste

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  1. Assessing Mechanisms Responsible for Non-Homogenous Emitter Electrospray from Large Arrays of FEEP and Colloid Thrusters

  2. Emitter Operation • liquid metal ion – FEEP Thruster • atomic ions • relatively large electric field • high efficiency • liquid metals do not wet Si • ionic liquid ion – Colloid Thruster • charged droplets • alternate droplet charge capillary feed concept • mN range for thrust – requires cluster of emitters • geometry not optimized • single emitter geometry (capillary, slit, ring, needle, …) • array spacing • unstable emitter operation • non-homogenous ion emission from arrays of emitters Lozanoand Martinez-Sanchez (2005)

  3. Non-Homogenous Emitter Electrospray • Mechanisms investigated: • internal and external liquid feed structures • charge depletion with ionic liquids (AC potential) • wetting characteristics • extrusion electrode geometry single emitter considerations • Mechanisms not yet investigated: • thin film stability • surface tension flows (Marangoni) • body & surface forces via charge • film rupture (dispersion forces) • capillary-driven flow (curvature) dependent upon: • single emitter geometry • single emitter operation • array geometry • array operation Goal is stable liquid feed with homogenous electrospray over emitter array.

  4. thin film stability • surface temperature variations drive Marangoni flow • body forces drive convective flows • (gravitational, ion drag, …) • charge accumulation on surface may perturb film • evaporation changes surface temperature • vapor (ion) recoil may perturb film • dispersion forces drive film rupture Film stabilizing/destabilizing mechanisms not understood. Pliq,needle = s/R(z) curvature-induced flow Pliq,base = s(1/r – 1/Rbase) • neglecting gas pressure: • liquid pressure decreases towards base of cone • liquid pressure increase at base due to 1/r • liquid pressure lowest in film Pliq,film = 0 Requires external force to stabilize liquid film.

  5. Technical Approach – Film Stability Surface Tension - Disjoining Pressure Surface Tension - Gravitational One-sided linear stability film evolution: • begin with 1D formulation to determine primary film destabilization mechanisms • conduct simple validation experiments • develop 3D formulation for assessing film stability for specific emitter geometries

  6. Technical Approach – Minimum Energy Film Morphology Surface Evolver – Energy Minimization Code Minimum energy morphology for fixed liquid volume in a flattened tube for various contact angles. Braun (2008) Minimum energy and linear stability map for liquid in a cylindrical tube. Allen, Son & Collicott (2009) • Use Surface Evolver to: • determine low energy liquid morphology for emitter array • determine linear stability limits of each morphology • optimize array geometry for stable liquid feed to emitter tips

  7. Anticipated Results • Establish stable liquid film: • define the coupling of mechanisms of which stabilize or destabilize thin liquid films – both metal and ionic liquids • validate stability model with planar film experiments • predict film destabilization modes for emitter geometries • optimize emitter geometry and array pattern for stable film morphology • Establish stable, homogenous elecrospray: • stable, uniform liquid feed to array of electrodes • define envelope for operating conditions

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