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Brief CMS and Atlas upgrade plans Status and follow up for: Newflex Eltos Techtra Recent contacts with: Tech Etch

Outline. Brief CMS and Atlas upgrade plans Status and follow up for: Newflex Eltos Techtra Recent contacts with: Tech Etch, CEA Saclay Feedback from Saclay on Cirea and recent CERN-Cirea contact Micromegas license status Messages to retain and conclusions.

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Brief CMS and Atlas upgrade plans Status and follow up for: Newflex Eltos Techtra Recent contacts with: Tech Etch

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  1. Outline • Brief CMS and Atlas upgrade plans • Status and follow up for: • Newflex • Eltos • Techtra • Recent contacts with: Tech Etch, CEA Saclay • Feedback from Saclay on Cirea and recent CERN-Cirea contact • Micromegas license status • Messages to retain and conclusions F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  2. CMS Muon upgrade (the numbers) Concerns Muonendcap Stations 1 and 2 (3 and 4 for later) GEM proposed as competitive technology to withstand the high rate requirement for eta>1.6 About 1000m2 of GEM foils in total 216 triple GEM detectors F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  3. CMS Muon upgrade (backward dates) (Data estimated from TP) • Installation during LS2 (2017-2018) • Manufacturing plan (GEM foils + assembly + tests and calibration) (2014-2016) • TP has been submitted for review on February 10th • TDR by end of year 2012 for approval spring 2013 ? • => Industrialization and setup of production sites in 2012-2013 <= F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  4. Atlas nSW upgrade project (the numbers) • Concerns small wheel Muon Stations • Micromegas proposed as competitive technology w.r.t. MDT+TGC/RPC and CSC About 1200m2 of resistive bulk 1024 MM layers F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  5. Atlas nSW upgrade project (backward dates) (Data from nSW meeting Oct 2011) • Installation in Atlas during LS2 (2018) • Commissioning nSW on surface (2017-2018) • Manufacturing plan (2015-2016) • Pre production first complete sector 0, i.e. 32 MM layers (2014) • nSWMoU and TDR during 2013 ? • Construction of large size MM prototypes and validation in 2012/2013 • => Industrialization and setup of production sites in 2012/2013 <= F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  6. NewFlex status • Company located nearby Seoul (South Korea) • Specialized in flex circuits, huge production capability (report presentation at RD51 miniweek 21-24 November) • Third visit on September 5th, 2011 • Feedback on first single mask 6x6 foil produced • => good micro-via quality, tested at CERN OK • => licensing • Launch production of 20 foil samples 10x10 • => received at CERN on December 20th • => visual inspection OK, cleaning done at CERN F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  7. Preliminary results from 10x10 GEM tests by Archana’s team (Please follow dedicated presentation at WG1 for more details) • Tests on 10x10 foils started at CERN beginning February 2012 • HV test passed • Gain calibration checked for 2 foils -> performance practically as for CERN GEM • Gain stability test during 1 hour shows ~5% shift -> test is still on-going Congratulations to Newflex for the excellent samples!! F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  8. NewFlex follow up • Prof. Sung Park visited us on February 2nd • Meeting organized to discuss next steps on technology transfer • Main identified actions: • (NB: the contribution of CMS for the detector qualification is essential) F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  9. Eltos status • Company located in Arezzo (Italy) • Full fine pitch rigid process technology in house and surface finishing with large board capability • (report presentation at RD51 miniweek 21-24 November) • First time knowledge transfer for non-resistive MMs performed on November 7th-8th 2011 • Two 10x10 MMs “bulked” with local supervision of Rui • (PCB and mesh stretching done by them, in-house cleaning) • Resistive process was presented to Eltos for next sample tries F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  10. Preliminary results from 10x10 MM tests by Joerg’s team Eltos CERN • Very recent results • 1st detector is sparking a lot -> reason is not identified yet (improve cleaning?) • 2nd detector has higher spark rate than the CERN S3 reference (see next slide), but is usable • Gain calibration performance very similar to CERN S3 non-resistive reference MM single point test, uniformity to be done • 55Fe charge spectra of Eltos’ MM is as good as the CERN reference F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  11. Preliminary results from 10x10 MM tests by Joerg’s team (1000 sec ≈ 16 min) Note: Max gain for 55Fe is 10000 (≈510V) Max gain for cosmics is 50000 (≈560V) Beyond these, chambers spark constantly and HV cannot be maintained Good start for Eltos, let’s go on with resistive bulk !! F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012 11

  12. Eltos follow up • Two days training at CERN were planned for February 9th and 10th, • but delayed last minute because of exceptionally bad weather conditions in Italy • Next slot for training at CERN to be confirmed for wk 13 • Next short steps : • (NB: guide from Atlas for the large size optimal roadmap is welcome) • (NB: the contribution of Atlas for the detector qualification is essential) F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  13. Techtra status • Company hosted at Wroclaw Technology Park (Poland) • Visited (by Rui and Fabio) on January 23rd-24th, 2012 • Goals: explore industrial support scope • present the single mask process (Rui) • Meeting with Mr. MaciejChorowski (Polish ILO) • and Mr. PiotrBielowka (Techtra CEO) • Wroclaw Technology Park is intended for: • - Promoting assessment of companies (new and existing) in the high tech field • - Renting offices, laboratories and equipments (start a business at lowest costs) • - Providing conference and training space, IT infrastructure (develop a knowledge network) • and general commercial, legal, administrative services for market development support • - Example of labs: mechanics, PCB assembly, GEM, cryogenics, vacuum, biology, … • - Easy liaisons with local universities • Techtra was the first company applying for GEM license • Is already producing GEMs w/double mask process • Max possible size 30x30 (mostly produced 10x10 or similar) • Own product: GEM-view standard scanner for x-ray imaging • Few units/yr sold F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  14. Techtra next steps • Techtra could offer support for: • cost attractive small/medium series and fast GEM prototype turn around • Main identified needs: • - get experienced with single mask process • - improve machines for sizeable production flow and larger width • - get confirmation of investment funds from public contribution • - train and secure competences (stable minimal manpower) • Company’s challenge is to develop means allowing preserving active resources: • - GEM only field -> sell foils or detectors to RD51 collaboration? • - Industrial applications -> join ventures w/industrial partners (e.g. Eldos)? • - Link w/universities -> stage program for students? • - Enlarge work abilities -> complete flex manufacturing line (via plating)? • - … Laminator Exposure Polyamide etching Copper etching Today the current action is with Techtra There is quite some hard work to organize, but the mission may not be totally impossible if coordinated on time Visual inspection F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  15. Techtra last minute news update • Report on last decisions taken at Techtra’s (from Mr. Bielowka message): • Move Techtra production line into a completely new location • The old rooms are to small for machine upgrade, and it is not possible to make them large enough. • 2) They have reserved the space in a different building (that belongs to WTP) • Mr. Bielowkawould like to calculate the necessary space after consultation with Rui, and after selection of all machines 3) The tests on the single mask process seemsto work well (although not yet perfect). They are quite optimistic about technological issues. 4) The financial support for machine investment is almost fixed F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  16. Tech Etch, CEA Saclay • Rui refreshed contacts with Tech Etch (Mr. David Crary) in January 2012 • - Tech Etch declared interest to upgrade to GEM single mask process • - They required instructions to go ahead (issue for Hartmut: license status ?) • - For large sizes they say have to check some machine compatibility (imaging and poly. etching) • - Rui asked quotation for large size (1.2mx0.5m) GEM foil production ranges: 100-1000-10000 • Waiting for feedback … to be continued • CERN workshop aims at investigating for common activities with CEA Saclay • There is very valuable knowledge on MM technology • Can we avoid duplications ? Can we identify common strategies ? • - Recent past actions: • Alain Delbart was invited to contribute to the visit to Eltos • On December 7th, 2011 Fabio flashed a visit to S. Aune’s MM lab (stretching and “bulking”) • A meeting with Alain is being organized (coordination w/Maksym) for future collaborations F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  17. Cirea News from Saclay (A. Delbart) • Goal for Cirea: learn and control full process, • including mesh stretching in house • 1st activity (TF10PCB – small MM) • One sample cannot sustain HV • Second sample has uneven mesh and HV is limited to 600V (in air) • If possible, second sample will be tested with gas in a defect free area • 2nd activity (PLV-3 PCB – 610cmx455cm bulk) • 3 samples will be shipped to Saclay soon for inspection • A meeting in CIREA will be organized to improve the bulk procedure CERN-Cirea recent contacts • Mr. Michel Billant E-Mailed to Rui and Fabio for a meeting at CERN on March 12th • to advertise their competence range in the domain and their industrial infrastructure • to show their progress on the bulk process variants and some remaining technical problems • to discuss how getting “qualified” on the basic standard bulk process • A presentation of CIREA to a future WG6 should be organized F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  18. Micromegas license status • Micromegas intellectual property defined by 4 patents: • Need to define an agreement to enable both CEA and CERN to release licenses to industrial partners • Framework agreement has been drafted: SylvianeZaninotti (CEA) will send a copy to HartmutHillemanns (CERN) this week to crosscheck Basic principle is as for GEMs: free license for academic use, minimal royalties for commercial • Self action for them: plan to come to a final document within 1Q12 • It would be nice finalizing this administration detail to start a good industrialization approach F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  19. Messages to retain • Atlas and CMS have quite similar global needs in terms of detector area and practically overlapping in time schedule • Additionally, there are many others “smaller” MPGD projects that have not been purposely mentioned (typically a few 10’s needing support in a timescale of 3-4 months) • RD51 has been successful to create opportunities for projects • and many of them can be performed in the CERN EM workshop because still quite manageable in volume and time schedule • To face large productions we need additional trained industrial partners and there are only 1 or 2 years in front of us F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

  20. Conclusions • The industrialization program for GEMs and MMs has began with Newflex and Eltos • Other companies are showing interest to our field (thanks RD51!) • Contribution of Atlas and CMS is important to help driving the next steps and essential to qualify test samples • Industry needs to be kept “busy” and we have to be aware that this is possible only if we all can invest in adequate manpower dedicated to this program • EM workshop is missing manpower to progress in the technology transfer task, if we intend to stay behind to the Atlas and CMS schedules • (1 process engineer function is most vital) F. Formenti - RD51 collaboration meeting February 20th-22nd, 2012

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