* Goal: Provide hands-on learning about concepts and methods in nanoscience.

1. NanoLab: A hands-on introduction to nanoscience for scientists and engineersLloyd A. Bumm and Matthew B. Johnson, University of Oklahoma,DMR-0304664 can serve as a framework for appreciating the broader issues when they encounter them in later courses. Topics we have covered are: crystal structure, x-ray diffraction, electron microscopy, electron microprobe, spectrophotometry, extinction, light scattering (Rayleigh & Mie), microfluidics, scanned probe microscopy, and thin-film growth. NanoLab is a sophomore level laboratory course in nanotechnology. We have taken this hands-on approach to introduce students to the concepts used in nanotechnology much earlier than they would see them in the standard curriculum. Although sophomore level students do not generally have the background to understand the full theoretical explanation of all the phenomena, they do take with them a basic understanding that * Goal: Provide hands-on learning about concepts and methods in nanoscience. * Vehicle: Lectures & Lab Activities.

2. First Lab Activity: Make an electroluminescent panel (ACTFEL) • Extinction Spectra of Au NanoparticlesEach group • prepares 2 different Au/citrate Sols • measures extinction spectra • models size using MiePlot • compares best fit & experimental spectrum • Clean Room Orientation • Photolithography to patternITO front electrode • Stepwise assembly • Make something that WORKS! Luxprint Inks courtesy of Dupont Electronic Materials MiePlot courtesy of www.PhilipLaven.com NanoLab: A hands-on introduction to nanoscience for scientists and engineersLloyd A. Bumm and Matthew B. Johnson, University of Oklahoma,DMR-0304664 NanoLab has been offered as an intensive intersession course and during the semester. The enrollment (6 & 12) included Physics and Engineering students. The graduate student who enrolled developed a module in her research groups area of expertise (microfluidics). • Microcontact Printing Pattern Transfer • photographic Film mask • photoresist master (MicroChem SU-8 2010) • PDMS stamp (Dow Corning Sylgard 184) • Patterned SAM etch resist on Pd film on Si • Etch Pd film to produce the final pattern • Use Pd film as etch resist of Si • HF etch Si substrate Pattern etchedin Pd filmon Si substrate NanoLab Students Perform AFM Lithography Original Mask Pattern Pattern in etchedinto Si substrate