The Roadmap for Design and Design for Manufacturing Andrew B. Kahng, UC San Diego CSE & ECE Departments Chair, ITRS Design ITWG, 2001–2003 ISMT Yield Council, September 25, 2003. Outline. The Design Roadmap DFM: Symptoms, Problem, Solution DFM Futures: Some Examples.
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The Roadmap for Design and Design for Manufacturing Andrew B. Kahng, UC San Diego CSE & ECE DepartmentsChair, ITRS Design ITWG, 2001–2003ISMT Yield Council, September 25, 2003
Voice Auto Translation
SW Defined Radio
Voice Print Recognition
Moving Picture Recognition
GOPS: Giga Operations Per Second
Incremental Cost Per Transistor
N.B.: 1998-2003 papers/tutorials: http://vlsicad.ucsd.edu/~abk/TALKS/
Design for Value Problem:
MaximizeTotal Design Value = i y(fi)*v(fi)
* See "Design Sensitivities to Variability: Extrapolation and Assessments in Nanometer VLSI", IEEE ASIC/SoC Conference, September 2002, pp. 411-415.
OPC solutions due to K. Wampler, MaskTools, March 2003
CD studies due to D. Pramanik, Numerical Technologies, December 2002
“Self-Avoiding” Subfield Order for Mask Write
Greedily optimized schedule
0#7: Restricted Layout
Dual Exposure Result
Example: PhasePhirst! (Levenson et al.)
Trim Mask Exposure
M. D. Levenson, 2003
Length-dependent spacing rules
Cao et al. U. Wisconson
TYPE 6Choice of Geometric Compression Operators
OASIS Format (recent SEMI standard) defines eight repetition types.
A repetitionrepresents an “array” of (polygon) records, enabling compression of layout data.
equivalent to “GDSII AREF”
Other OASIS repetition types
Dennis Sylvester, U. Michigan