html5-img
1 / 33

The SEMATECH Cost of Ownership Model

The SEMATECH Cost of Ownership Model. Mike Berman U of Arizona. AGENDA. Why use it? How to use it? What if? CoO of a new system Process 1 Vs Process 2 Quality Improvement Tool Summary. Purpose:.

alaura
Download Presentation

The SEMATECH Cost of Ownership Model

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript


  1. The SEMATECH Cost of Ownership Model Mike Berman U of Arizona

  2. AGENDA • Why use it? • How to use it? • What if? • CoO of a new system • Process 1 Vs Process 2 • Quality Improvement Tool • Summary

  3. Purpose: • “The SEMATECH Cost of Ownership (SCoO) model was developed to address the economic and productive performance of a tool while operating in pre-production or in production.”

  4. Description: • “The SCoO model is a calculator to perform a cost comparison of options for completing a step in a semiconductor wafer fabrication process”

  5. Why is the SCoO so important? • Manufacturing cost control is critical to survival in the market place. • For cost control you must: • Know the cost of each step • Understand the reasons for these costs • Control and reduce the costs • ASP’s drop each year, So must costs!!!

  6. Why use the SEMATECH Model? • Independent of OEM & the Supplier • Developed by SEMATECH • It is the De Facto standard • It permits “Apple’s to Apple’s comparisons

  7. Cost of Ownership Calculation

  8. The SEMATECH Model is NOT • A MEASURE OF THE PROCESS • If the new process does not work or • Has a lower yield, do not waste your time • ABSOLUTE • Able to make tools smaller!

  9. Model Description • The Model is very comprehensive • Up to 90 inputs & 210 output parameters • Can be used with as few as 10 inputs & 1 output • Once understood it produces simple and fast results • The Rewards are enormous: High benefit to effort ratio Detailed insight into the cost makeup of each step “What if” type questions can be addressed • The SCoO is most useful as a comparison tool.

  10. Dos & Do Nots: • Do not “improve” the technique used to find the values • Do “add spreadsheets within the spreadsheet” • See next page for examples

  11. Examples • For sputter Target cost per wafer: • Target Life, Target cost, Avg. process dep • Cost of gas per wafer(Etch/CVD): • Volume & cost of tank • Usage, flow and time (all steps) • Cmp • Pad cost, life(in polish mins or wafers)

  12. Major parts of the Model: • Title: Fill in more detail than you will need! • In 1 year they will all look the same! • VOLUME/THROUGHPUT DATA • EQUIPMENT DATA • PRODUCTION/RUNNING DATA (usage) • MAINTENANCE COSTS • PERSONNEL PER SYSTEM /STANDARD RATES • ANNUAL COST PER GOOD WAFER ($) • MANAGEMENT SUMMARY • PHOTO LITHOGRAPHY WORK SHEET

  13. E10-90 Equipment States Stacking Chart

  14. Title: Fill in more detail than you will need!

  15. VOLUME/THROUGHPUT DATA

  16. EQUIPMENT DATA

  17. PRODUCTION/RUNNING DATA (usage)

  18. MAINTENANCE COSTS

  19. PERSONNEL PER SYSTEM /STANDARD RATES

  20. The “Must” have lines (only 7)

  21. The more you use, the better it is!

  22. How to use the SCoO It’s in Excel-not PowerPoint!

  23. Standard Rates • Burdened Salary • Engineer $115,000 • Supervision $100,000 • Operator $30./Hr • Maintenance $35./Hr • Administrative Rates • Insurance 0.47 % • Personal Prop. Tax 1.34 % • Interest 10.0 % • Inflation Rate 3.0 % • Life of Equipment 5 years • Test Wafer Cost $80.00 • Value of incoming $100 to $1400 • Value of completed $1,500.

  24. Output (line 525)

  25. Output (line 357/382)

  26. SURPRISES !! • Capital cost of the equipment may not be the driver for Cost of Ownership • MTBF (>75 hr.) impact on utilization & cost reduction is not as significant as previously thought • Defect density & Line Yield are far more important then previously anticipated • The cost of the wafer at the process step is more important than previously considered

  27. Defect Density • Die area (Line 104) 1 cm2 • Probability of a failure (Line 105) 16.6% • Defect Density (Line 21) Vs Cost of Wafer .01 (defects/cm2) $8.49 .05 $15.06 .10 $23.27 .2 $39.69 .5 $88.95 .9 $154.64

  28. CoO Scrap ($) Calculation

  29. CoO of a “New System” • Use your “best” numbers • Be fair • Use a run rate of Max. (for most models) • This is NOT a measure of the Process • This is only an estimate, your real cost may vary

  30. Process 1 Vs Process 2 • Be Fair • Throughput & Defect Density are the main Drivers. • Use “real” numbers, not specs • If you do not have “Real” Defect Density Data, use “0”.

  31. Quality Improvement Tool • Major use of the Model • Only change key cells • Changes in “Throughput” need changes in “Production requirements” • This can be used for “small changes”

  32. How do I get my copy? • SEMATECH stopped support on 4-15-95. • Now it is call “ TWO COOL” from Wright, Williams, & Kelly • 11875 Dublin Boulevard, Suite D262 • Dublin, CA 94568 • 1-510-803-5880 • Cost $7,190.00 (in 1995)

  33. SUMMARY • You now know more than most users • Use it, work with it • Split your screen, place line 382 at the top of your screen, and make changes and see how they change the total CoO.

More Related