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Semiconductor Cleaning

We offer Cleaning before the beginning of the line process, It may be dry cleaning, Wet Cleaning Combination of both

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Semiconductor Cleaning

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  1. Type of Cleaning Process Pre-Diffusion Clean Laser cleaning Hydrofluoric Acid Dip Wet cleaning  Metallic Ion Removal Clean Dry cleaning Standard Clean 1 and 2 Megasonic Cleaning Ozone Cleaning Standard Clean 1 and 2 RCA Clean

  2. Very broadly, semiconductor cleaning techniques can be divided into 3 types: 1. Mechanical methods 2. LASER BASED 3. SUPERCRITICAL FLUID

  3. Patenting Trend Comparison

  4. Assignee Distribution

  5. Origin of the patent

  6. Technology Evaluation Technology Investment Strategy • Invention/Innovation Analysis • Patentability Searches • Knock Out Searches • Landscape Analysis • Competitive Intelligence • Technology Scouting • Global Patent Drafting • Global Patent Filing • Prosecution Support • Technology Watch • Strategic patent prosecution • Portfolio Optimization Securing IP Rights Continued Innovation Reach out to us at iiprd@iiprd.com

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