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1. 1 Digital Integrated CircuitsA Design Perspective
2. 2 The Wire
3. 3 Interconnect Impact on Chip
4. 4 Wire Models
5. 5 Impact of Interconnect Parasitics Interconnect parasitics
reduce reliability
affect performance and power consumption
Classes of parasitics
Capacitive
Resistive
Inductive
6. 6 Nature of Interconnect
7. 7 INTERCONNECT
8. 8 Capacitance of Wire Interconnect
9. 9 Capacitance: The Parallel Plate Model
10. 10 Permittivity
11. 11 Fringing Capacitance
12. 12 Fringing versus Parallel Plate
13. 13 Interwire Capacitance
14. 14 Impact of Interwire Capacitance
15. 15 Wiring Capacitances (0.25 mm CMOS)
16. 16 INTERCONNECT
17. 17 Wire Resistance
18. 18 Interconnect Resistance
19. 19 Dealing with Resistance Selective Technology Scaling
Use Better Interconnect Materials
reduce average wire-length
e.g. copper, silicides
More Interconnect Layers
reduce average wire-length
20. 20 Polycide Gate MOSFET
21. 21 Sheet Resistance
22. 22 Modern Interconnect
23. 23 Example: Intel 0.25 micron Process
24. 24 INTERCONNECT
25. 25
26. 26 The Lumped Model
27. 27 The Lumped RC-ModelThe Elmore Delay
28. 28 The Ellmore DelayRC Chain
29. 29 Wire Model
30. 30 The Distributed RC-line
31. 31 Step-response of RC wire as a function of time and space
32. 32 RC-Models
33. 33 Driving an RC-line
34. 34 Design Rules of Thumb rc delays should only be considered when tpRC >> tpgate of the driving gate
Lcrit >> ? tpgate/0.38rc
rc delays should only be considered when the rise (fall) time at the line input is smaller than RC, the rise (fall) time of the line
trise < RC
when not met, the change in the signal is slower than the propagation delay of the wire