'Sio2 layer' presentation slideshows

EBB 323 Semiconductor Fabrication Technology

EBB 323 Semiconductor Fabrication Technology. Oxidation. Dr Khairunisak Abdul Razak Room 2.03 School of Material and Mineral Resources Engineering Universiti Sains Malaysia khairunisak@eng.usm.my. Outcomes. By the end of this topic, students should be able to:

1.45k views • 57 slides

Chapter 2 Modern CMOS technology

Chapter 2 Modern CMOS technology. Introduction. CMOS process flow (continued). NE 343: Microfabrication and thin film technology Instructor: Bo Cui, ECE, University of Waterloo; http://ece.uwaterloo.ca/~bcui/ Textbook: Silicon VLSI Technology by Plummer, Deal and Griffin. Gate oxide growth.

267 views • 26 slides

Fundamental reliability issues of advanced charge-trapping memory devices

521 views • 18 slides

CMOS Compatible Integrated Dielectric Optical Waveguide Coupler and Fabrication

2011-2 Special Topics in Optical Communications. CMOS Compatible Integrated Dielectric Optical Waveguide Coupler and Fabrication. Jeong -Min Lee ( minlj@tera.yonsei.ac.kr ) High-Speed Circuits and Systems LAB. 2011-2 Special Topics in Optical Communications. Information.

331 views • 12 slides

Photolithography

Photolithography. Why Photolithography. Low cost IC manufacturing Due to large number of lithographic steps needed in IC manufacturing, lithography typically accounts for about 30% of cost of manufacturing. Photolithography cost minimize result in low cost IC

432 views • 10 slides