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SiO 2 ETCH PROPERTY CONTROL USING PULSE POWER IN CAPACITIVELY COUPLED PLASMAS * Sang-Heon Song a) and Mark J. Kushner

SiO 2 ETCH PROPERTY CONTROL USING PULSE POWER IN CAPACITIVELY COUPLED PLASMAS * Sang-Heon Song a) and Mark J. Kushner b) a) Department of Nuclear Engineering and Radiological Sciences University of Michigan, Ann Arbor, MI 48109, USA ssongs@umich.edu

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