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Fabrication Protocol SNG4951D

Fabrication Protocol SNG4951D. Responsible: Pradeep Co-responsible: Dirk Date of delivery: 3/30/2011. Sample Description. A. B. General remarks fabrication: Height of pillars ~ 32 nm (3nm Ta/7nm Ru /10nm Cu/12nm CFB). SiO2 buffer layer is ~60 nm around the pillar region. . 1. 2.

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Fabrication Protocol SNG4951D