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Neelkanth G. Dhere and Anil Pai

Development of Tribological Coatings for Cryocoolers T ask III. 4 Hydrogen Storage for Spaceport and Vehicle Applications. Neelkanth G. Dhere and Anil Pai. Titanium Nitride (TiN) Coatings.

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Neelkanth G. Dhere and Anil Pai

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  1. Development of Tribological Coatings for CryocoolersTask III. 4 Hydrogen Storage for Spaceport and Vehicle Applications Neelkanth G. Dhere and Anil Pai

  2. Titanium Nitride (TiN) Coatings • Several more depositions of TiN films by DC magnetron sputtering were carried out. The limit in terms of varying the argon to nitrogen ratio was reached as the films indicated greater porosity and signs of peeling off. • Characteristic golden color of TiN films was achieved. • XRD analysis of the above samples indicated fully reactive microcrystalline TiN nature which may possibly provide excellent hardness. • Additional samples on aluminum substrates will be prepared using optimized parameters based on the above observations for XRD, microhardness, wear and coefficient of friction analysis. Some of these tests will be carried out with the assistance of Dr. Sawyer at UF.

  3. Titanium Nitride (TiN) Coatings • The coefficient of friction and wear measurements will be carried out with the assistance of Dr. Quanfen Chen and his colleagues at UCF. • These measurements require the film to be deposited on three bumps on 1cm x 1 cm silicon wafer to minimize the contact area between two rubbing samples and providing more accurate coefficient of friction and wear measurements. • The silicon sample preparation involves the design and fabrication of the mask required to obtain the bumps on the wafer and is being done. • A sketch of the mask has been prepared

  4. Mask Sketch 1cm * 1cm Si Wafer 0.75 mm cylindrical bumps

  5. Molybdenum Disulphide (MoS2) Coatings • Depositions of MoS2 by RF magnetron sputtering were carried out. • XRD analysis of the samples indicated fully reactive microcrystalline MoS2 nature. • Deposition of bilayer coatings of TiN and MoS2 on a glass substrate have been carried out. • Testing of the above film will be carried out for satisfying requirements of good wear resistance and low coefficient of friction coatings.

  6. Indium Tin Oxide (ITO) Coatings • Depositions of ITO by RF magnetron sputtering have been carried out. • ITO films have met satisfactory requirements and have been verified by Mr. Rajnikant. • Depositions on actual Quartz glass will be carried out. • TiN coatings on gears were also done for Dr. Chow and colleagues.

  7. Tasks to be Accomplished • Characterization of bilayer coatings of TiN and MoS2 on a glass substrate is being planned. • Depositions of TiN on aluminum substrates will be carried out for microhardness, wear and coefficient of friction analysis at UF. • Coefficient of friction and wear measurements at UCF on Si wafer will also be carried out with the assistance of Dr. Chen and his colleagues. • Microwave assisted plasma chemical vapor deposition system (MWCVD) Purchase Order has been submitted to Dr Block and the system will be procured for depositions of diamond-like carbon (DLC) coatings.

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