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Thin film synthesis

Thin film synthesis. Secondary hypotheses. 1. Graded composition sputtering is suited to produce a large number of HEA compositions (libraries), of which a significant proportion has a well-defined crystal structure.

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Thin film synthesis

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  1. Thin film synthesis

  2. Secondary hypotheses 1. Graded composition sputtering is suited to produce a large number of HEA compositions (libraries), of which a significant proportion has a well-defined crystal structure. 2. It is possible to screen a large variety of functional properties of such libraries with established high-throughput methods. 3.The experimental data obtained can be curated by machine learning algorithms. 4. Density Functional Theory (DFT) calculations can provide additional useful input for the ML algorithms when experimental results are not available. 5.QMC is a viable technique for calibration and validation of DFT band gaps. 6. Oxygen content can introduce a novel dimension to the global composition space of HEA. 7. Other additives can be employed to further extend the compositional space towards e.g. borides, carbides and nitrides.

  3. Expectedthin film synthesisactivities at SINTEF • Plan 1: autumn 2018. • Graded O-composition in CoCrFeNiCualloy system – will be done using an old sputteringmachine at SINTEF • Plan 2: spring 2019: • High throughputsynthesis of gradedalloycompositions at 6'' wafersize. O, H, N content is constant. Not all metals will be allowed, due to potential cross-contaminationissues.

  4. High-entropy materials for optoelectronic applications Transparency CoCrFeNiCu.O (15%) CoCrFeNiCu.H Figure 1: CoCrCuFeNi installed in sputter chamber, with uniformity shields

  5. Main system description • Thin film deposition in 3 independent vacuum-chambers • Central transfer chamber incl. automatic robotic substrate handler • Turbo molecular pumps on load lock, transfer and all process chambers. • Vacuum (10E-8mbar) • 2 free slots for future upgrades

  6. Twosputteringchambers • Sputtering of conducting and non-conducting materials at Tsubstrate up to 800°C • Reactive sputtering in H2, N2 & O2 • Monitoring of gas impurities, reactive sputtering (Residual gas analyser -RGA) • Porous films glancing angle sputtering + sputtering on tubes possible • Plasma etch for substrate cleaning

  7. Comet project • Heat harvesting based on phase transformation materials (PTMs) • Synthesis of compositionally graded films for high-throughput experimental search and validation of theoretically predicted PTM properties. • Link first-principles calculations, synthesis, and characterization of microscopic and functional properties of multiferroic PTMs.

  8. Effect of sputteringtemperature 10 my 10 my Ni Al21Ni51Cu28 Al23Ni55Cu22 200 nm Al14Ni8Cu78 200 nm Al28,3Ni11,3Cu60,3 Al44Ni21Cu35 Al75Ni12Cu13 Al51Ni6Cu43 10 my Multiphaseaverage: Al69Ni515Cu16 Al79Ni4Cu17 Al Al Al82Ni5,5Cu12,5 RT 250°C 400 °C Al 1 my 10 my 10 my Cu

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