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Pressure Dispense Efficiency

Pressure Dispense Efficiency. Damo Srinivas Lou Blanchard. Outline. Industry drivers Pressure Dispense Technology v. Traditional Methods Application Example – Semiconductor CMP Business Outlook. Delivery Method and Materials are Inseparable. Superior Process

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Pressure Dispense Efficiency

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  1. Pressure Dispense Efficiency Damo Srinivas Lou Blanchard

  2. Outline • Industry drivers • Pressure Dispense Technology v. Traditional Methods • Application Example – Semiconductor CMP • Business Outlook

  3. Delivery Method and Materials are Inseparable Superior Process Results in Volume Manufacturing • Advanced Materials – High impact, and precious • Delivery Methods - Must enable full potential of materials • Yield • Performance • Cost • Environmental Materials Technology Delivery Method Material Selection Containment and Delivery Enables Process Tech. Enables high volume mfg. Two sides of the same coin

  4. Traditional Pump Pressure Dispense • Inherent limitations of pump technology • High cost and maintenance issues • Pump cavitation can induce defects (bubble formation) • Dedicated, inflexible support systems (e.g. Central Distribution system) • Process variation • Performance improvement through pump elimination • Reduced maintenance costs and downtime • Elimination of defect-causing bubbles in chemistry • Flexibility of configurations and support system • Tighter process controls Pressure Dispense Efficiency

  5. Applications for Pressure Dispense • Flat Panel Display • Color Filter • Photolithography • Liquid Crystal • Semiconductor • Photolithography • CMP Slurries • New Applications • High Value Chemicals • Maximum chemistry utilization • Increased substrate throughput • Enables tool-specific chemical formulations and delivery • Lowest operating cost • Lower capital expenditures

  6. Pressure Dispense System Operation

  7. Extending Pressure Dispense to Copper CMP Most Inefficient Process in Back End of Line: • Process variability induced by slurry delivery • Fixed material concentrations resulting in process compromises • Inefficient material use • Process bottlenecks leading to lower throughput

  8. 30 30 70 60 60 CMP – One Size Fits All ApproachThe Problems with Status-Quo 30 30 P1 P2 P3 BB1 BB2 Inflexible Process Constraints #1 #2 #3 #4 #5 Turns & plumbing variability Fab Sub Fab Line length variability Backpressure Control Valve Head pressure variability Mixer Remote Instrumentation Distribution Tank Global Loop Supply Vessel Distribution Pump Fixed concentrations: Process knobs are constrained ProcessVariability

  9. A Novel CMP solution that integrates: • Proven Pressure Dispense technology • Cu & Barrier Slurries • Brush & Pad clean chemistries • To Eliminate: • Process Inefficiencies in CMP (most inefficient process in BEOL) • And Enable ATMI to: • Gain market share in a fragmented, non-differentiated slurry market • Strengthen the Post-CMP cleans revenue growth • Generate new Liner revenue stream (recurring) Pad Clean BB Clean P1 P2 P3 CMPlicity TM – Integrated Solution to CMP Water Peroxide Air CMPlicity

  10. Pad Clean BB Clean P1 P2 P3 30 CMPlicity TM – Integrated Approach 30 10 70 60 60 60 60 30 30 30 30 30 CMPlicity 20 P1 P2 P3 BB1 BB2 P1 P2 P3 BB1 BB2 Optimized Process Enabled Superior Process Control

  11. Operational Process Efficiency BCDS 1 BCDS 2 BCDS 3 Capital Investment = $54.6M Bulk Chemical Delivery System Investment = $4.1M Conventional Approach Capital Equipment Investment = $37.8M CMPlicity Delivery System Investment = $2.7M CMPlicity Approach * Calculations based on a fab running 30K wspm Customer Capital Savings = $19M

  12. CMPlicity TM - Benefits Summary BCDS 1 BCDS 2 BCDS 3 Superior Process Control • Modular design with precise flow control -Superior process control and tool to tool matching • Ability to deliver super concentrated slurries -Low slurry usage/wafer • Slurry composition flexibility within process step -Higher throughput enabled, leading to significantly lower capital investment $19M Savings

  13. CMPlicity CMP - Market Potential for ATMI System, Liner, Cu Slurry, $16 M $140 M $110 M $105 M Barrier Slurry, Brush Clean, $120 M Pad Clean, $120 M $24 M CMPlicity TAM $529M TAM Opportunity in 2011 20% market share is > $100M revenue opportunity

  14. Q&A

  15. ATMI, the ATMI logo, AccuDose, AutoClean, Better Process. Delivered., Cerulean, EPM, ErgoNOW, GasGauge, IDEAL Clean, LOK cap, NOWPak, NOWTrak, PDMPak, ProAct, the ProAct logo, ProE-Vap, RegenSi, SAGE, The Source of Process Efficiency, TiTaN Kleen, UniChem and VAC are trademarks or registered trademarks of Advanced Technology Materials, Inc. in the United States, other countries or both. SDS is a trademark or registered trademark of Advanced Technology Materials, Inc. and Matheson Gas Products, Inc. in the United States, other countries or both. Other company, product, or service names may be trademarks or service marks of others.

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