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EZ-COURSEWARE State-of-the-Art Teaching Tools From AMS Teaching Tomorrow’s Technology Today

EZ-COURSEWARE State-of-the-Art Teaching Tools From AMS Teaching Tomorrow’s Technology Today. New Trends in VLSI Design. Processor Performance. Why is Performance Improving?. Better circuit design More memory, cache and register More parallelism (wider data bus, pipelining, etc.)

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EZ-COURSEWARE State-of-the-Art Teaching Tools From AMS Teaching Tomorrow’s Technology Today

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  1. EZ-COURSEWAREState-of-the-Art Teaching ToolsFrom AMSTeaching Tomorrow’s Technology Today www.advancedmsinc.com

  2. New Trends in VLSI Design www.advancedmsinc.com

  3. Processor Performance www.advancedmsinc.com

  4. Why is Performance Improving? • Better circuit design • More memory, cache and register • More parallelism (wider data bus, pipelining, etc.) • Transistors are switching faster!!!! www.advancedmsinc.com

  5. Simple Scaling www.advancedmsinc.com

  6. Chip Area 1.5 1.0 0.8 0.6 0.35 0.25 Remark: mm = mircon Intel 386 DX Technology (mm) Intel 486 DX Pentium Pentium Pro & Pentium II 1cm2 www.advancedmsinc.com

  7. Transistor Count vs. Year www.advancedmsinc.com

  8. Average Transistor Price vs. Year www.advancedmsinc.com

  9. Can Scaling Continue in Future? • Scaling works well in the past • In order to keep scaling to work in the future, many technical problems need to be solved. www.advancedmsinc.com

  10. The Roadmap • National Technology Roadmap for Semiconductors (NTRS) • Called ITRS (International TRS) since 4th Ed • Projection of future technology requirements for the next 15 years. www.advancedmsinc.com

  11. Roadmap Overview • Focus Technology Working Groups • Design & Test • Process Integration, Devices & Structures • Front End Process • Lithography • Interconnect • Factory Integration • Assembly & Packaging • Crosscut Technology Working Groups • Environment, Safety & Health • Defect Reduction • Metrology • Modeling & Simulation www.advancedmsinc.com

  12. Technology Characteristics *Data for high-performance microprocessor *Data from 97 Edition of Roadmap www.advancedmsinc.com

  13. Technical Problemswith Future VLSI Technology www.advancedmsinc.com

  14. Too much transistors • Design are too complicated • No way to do it manually • Solutions: • CAD • Design hierarchically • Design reuse www.advancedmsinc.com

  15. Area, Performance, Power, Noise • Important to keep area small. • How to achieve such a good performance? • Power consumption is huge. Heat dissipation is also a problem. • Both Capacitive and Inductive Noises are not ignorable now. • Solutions: • Physical Design is an appropriate stage to handle all these. • Many research needs to be done. www.advancedmsinc.com

  16. Interconnect Area • Too many interconnects. • Occupy too much area. • Solution: • More interconnect layers. • Made possible by Chemical-Mechanical Polishing (CMP). • Note that more layers doesn’t necessarily mean less interconnect area. • Also, routing is no longer a 2-D problem. Hence, new CAD algorithms needed. www.advancedmsinc.com

  17. SEM Photo of Metal Layers www.advancedmsinc.com

  18. Cross-Section of Metal Layers www.advancedmsinc.com

  19. Interconnect Delay 1989 1992 1995 1998 2001 2004 2007 Technology Generation(mm) Source: SIA Roadmap 97

  20. Interconnect Delay • Dominating factor in determining circuit performance nowadays. • Solutions: • Copper wire • Low-k (dielectric constant) material • Interconnect Optimization at physical design www.advancedmsinc.com

  21. Design Planning • Need to plan ahead during the early stages of VLSI design cycle. • Need to take physical design into consideration early. • Many research needs to be done. www.advancedmsinc.com

  22. Summary • Technology Trend: • Transistors are smaller. • Transistors and Interconnects are denser. • Chip areas are larger. • Number of metal layers are more. • Problems: • Design complexity. • Tradeoff of Area, Performance, Power, Noise. • Interconnect area and Interconnect delay. • Increasing planning requirements. www.advancedmsinc.com

  23. www.advancedmsinc.com

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