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An Analysis of DG SOI MOSFET Modeling and Simulation with PSP, BSIM-IMG and HiSIM_SOTB

An Analysis of DG SOI MOSFET Modeling and Simulation with PSP, BSIM-IMG and HiSIM_SOTB. Guofang Wang, Jun Liu June 21 , 201 9 The Key Laboratory for RF Circuits and Systems of Ministry of Education, Hangzhou Dianzi University. Outline. 1. Introduction. Bulk CMOS. PD/FD SOI MOS.

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An Analysis of DG SOI MOSFET Modeling and Simulation with PSP, BSIM-IMG and HiSIM_SOTB

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  1. An Analysis of DG SOI MOSFET Modeling and Simulation with PSP, BSIM-IMG and HiSIM_SOTB Guofang Wang, Jun Liu June21, 2019 The Key Laboratory for RF Circuits and Systems of Ministry of Education, Hangzhou Dianzi University

  2. Outline

  3. 1. Introduction Bulk CMOS PD/FD SOI MOS SOI (Silicon On Insulator)

  4. 1. Introduction size ofthedevicereduced integrationdegreeincreased application frequency  increased Undesirable phenomena brought

  5. 1. Introduction schematic structure of DGMOSFET Advantages • higher integration • higher transconductance • higher electron mobility • inhibit SCEs

  6. 2.Model Development and Extraction • PSP PSP NXP CEA-LETI • physical equations and scalability • contain all physical effects • substrate model

  7. 2.Model Development and Extraction Advantages: independent double-gate structure FD & DG devices back gate biasing effect back-gate depletion Disadvantages: no charge accumulation Process affect switch application • BSIM-IMG

  8. 2.Model Development and Extraction Advantages: ultra-thin SOI BOX layer double-gatestructure allthecharges Disadvantages: model description substrate model • HiSIM_SOTB

  9. 3、Model Verification • HiSIM_SOTB • BSIM-IMG & PSP

  10. 3、Model Verification • PSP (b)transconductance • transfer characteristic the two simulation lines are almost coincident at Vbg = - 5 V and Vbg = 0 V

  11. 3、Model Verification • BSIM-IMG (b)transconductance • transfer characteristic The three simulation lines are fitting good at different back-gate bias

  12. 3、Model Verification • HiSIM_SOTB • transfer characteristic (b)transconductance the two simulation lines are almost coincident at Vbg = 0 V and Vbg = 5 V

  13. 3、Model Verification Comparison of transfer characteristics at Vbg = -5 V

  14. 3、Model Verification Comparison of transfer characteristics at Vbg = 0 V

  15. 3、Model Verification Comparison of transfer characteristics at Vbg = 5 V

  16. 3、Model Verification Table Error of simulation accuracy

  17. 4.Conclusion • Three models are selected to modeling • and simulation • C-V and I-V characteristics have been presented • The BSIM-IMG model has slightly insufficient in • C-V characteristic • BSIM-IMG is more accurate in I-V characteristic

  18. THE END

  19. THE END Thankyou!

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