1 / 6

Update from ALD group IN ANL

Update from ALD group IN ANL. Qing Peng, Anil Mane, Jeff Elam Energy System. With collaboration from Seon Woo Lee and Hau Wang. NEW IV measurement method. Picture of pattern electrodes on the ALD film with two electrode under measurement. Size of the Metal pad: 300 um, 200um, 100um, 50um

bworkman
Download Presentation

Update from ALD group IN ANL

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript

  1. Update from ALD group IN ANL Qing Peng, Anil Mane, Jeff Elam Energy System

  2. With collaboration from Seon Woo Lee and Hau Wang NEW IV measurement method

  3. Picture of pattern electrodes on the ALD film with two electrode under measurement Size of the Metal pad: 300 um, 200um, 100um, 50um Distance between the metal pad: 50um, 100 um, 200um, 400 um, 800 um, Generated by Shadow Mask Electrode Pad ALD film glass Benefit: Electrical study without needs for MCPs More precise measurement system Fast rate for screening materials

  4. First result of IV on MgZnO from the New Method 300 um pat size, 100 um distance 300 um pat size, 1600um distance More data are/will be collecting for systematic study of the electrical properties of Resistive materials

  5. Update of Synkera AAO plates

More Related