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Outgassing Evaluation More Moore, SP3 WP6, for Task 3.6.1.6.1 and 3.6.2.3

Outgassing Evaluation More Moore, SP3 WP6, for Task 3.6.1.6.1 and 3.6.2.3 Elettra and AZ Electronic Materials Athens 12.Mai 2005. Objectives for Outgassing Low or no Outgassing chemicals is a requirement for the EUV exposure tool shelf life

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Outgassing Evaluation More Moore, SP3 WP6, for Task 3.6.1.6.1 and 3.6.2.3

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  1. Outgassing Evaluation More Moore, SP3 WP6, for Task 3.6.1.6.1 and 3.6.2.3 Elettra and AZ Electronic Materials Athens 12.Mai 2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  2. Objectives for Outgassing • Low or no Outgassing chemicals is a requirement for the EUV exposure • tool shelf life • First specifications for outgassing are given by • ASML • Resist outgas specifications for Alpha tool: • H20 4.7E15 (molec/s*cm2) • CxHy(integr. > 44 AMU) 4.7E13 • F/Cl 4.7E14 • S/P 4.7E11 • Si 4.7E9 • PAG fragments (S/P) most critical • Intel Outgassing 5*1010 [molecules/cm²] at Esize (onlyinternal) Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  3. Intel and Sematech are working on outgassing • test procedure for outgassing • characterization of of outgassing behavior of EUV resists and related materials:a) qualitativly • b) quantitativly • Outgassing experiments within More Moore and ExCite • are needed to have test equipment and to get experience • are needed to characterize the EUV resist materials • are needed for selection of appropriate EUV resist material. Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  4. Intel Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  5. Where More Moore stands Outgassing test equipment set up at Elettra Synchrotron Trieste Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  6. PHS-Methacrylate Polymer m/e=12-18, Polymer m/e=27-30, Polymer m/e=43-45, Polymer m/e=28,CO, C2H4 m/e=15,CH3 m/e=44; CO2 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  7. PHS-Methacrylate Polymer + PAG (TPS-Triflat)  m/e=12-18, Polymer m/e=27-30, Polymer m/e=44-45, Polymer m/e=78; C6H6 m/e=31-40, PAG m/e=64; SO2 m/e=48; SO m/e=69; CF3 m/e=20,HF m/e=26, PAG Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  8. PHS-Methacrylate based EUV Photoresist m/e=12-18, Polymer m/e=28, Polymer m/e=43-45, Polymer m/e=48; SO m/e=64; SO2 m/e=78, C6H6,PAG m/e=31,38 PAG Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  9. Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  10. PHS-Methacrylate Polymer + PAG (TPS-Triflat) m/e=48; SO m/e=64; SO2 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  11. PHS-Methacrylate Polymer + PAG (TPS-Nonaflat) m/e=48; SO m/e=64; SO2 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  12. Methacrylate Polymer Based Resist Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  13. Methacrylate Polymer Based Resist Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

  14. Conclusion • PAGs, which create Perfluorsulfonic acids outgass under EUV with SO,SO2 • More data needed • Confirmation of reliability and precicion of measurement • Analyses of mass fragments • Quantification of outgassing in relation to specification of exposure tool Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

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