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UNECS-2000 UNECS-3000A

UNECS-2000 UNECS-3000A. Compact High-Speed Spectroscopic Ellipsometer. Components Division, ULVAC, Inc. UNECS series. UNECS-2000 Φ 200mm motorized type. UNECS-3000A Φ 300mm auto-mapping type.

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UNECS-2000 UNECS-3000A

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  1. UNECS-2000UNECS-3000A Compact High-Speed Spectroscopic Ellipsometer Components Division, ULVAC, Inc

  2. UNECS series UNECS-2000 Φ200mm motorized type UNECS-3000A Φ300mm auto-mapping type UNECS series is the most advanced ellipsometer which utilizes high-order retarders. It achieve high-speed measurement, downsizing of sensor head and excellent cost performance, which are difficult for other conventional models. It features a motorized stage and makes high-precision measurement with simple operation. UNECS（小型）資料

  3. Application UNECS（小型）資料

  4. Resists Si substrate SiO2 Si substrate Measurement data example (SiO2, resists) (1) SiO2single-layer film (2) Resists single-layer film （thickness and refractive index simultaneous measurement） (3) Resists/ BARC 2 layer film (4) Resists 3 layer film （thickness and refractive index simultaneous measurement） Top coating Resists ＢＡＲＣ Si substrate Resists ＢＡＲＣ Si substrate Remarks: Repeatability is the standard deviation of 10 times consecutive measurements (1σ). UNECS（小型）資料

  5. Alq3 Glass substrate Measurement data example (OLED, PV) • OLED：　Alq3／Glasssingle-layer film (2) Thin-film PV： SiO2／μc-Si／Glass 3 layer film SiO2 μc-Si Glass substrate Remarks: ‘Dektak’ is ULVAC bland stylus thickness gauge. UNECS（小型）資料

  6. Resists Si substrate SiO2 Si substrate Measurement data example (Single-layer film) (1) SiO2 single-layer film (2) Resists single-layer film （thickness and refractive index simultaneous measurement） Remarks: Repeatability is the standard deviation of 10 times consecutive measurements (1σ). UNECS（小型）資料

  7. Top coating Resists ＢＡＲＣ Resists Si substrate ＢＡＲＣ Si substrate Measurement data example (Multilayer film) (3) Resists/BARC　2 layer film (4) Resists3 layer film (2 layer simultaneous measurement) (Top coating thickness and refractive index simultaneous measurement) Remarks: Repeatability is the standard deviation of 10 times consecutive measurements (1σ). UNECS（小型）資料

  8. Auto mapping function The film thickness distribution can be visually checked since the measurement result is displayed in 2D color map. R-θ mode X-Y mode Evaluation time can be significantly reduced by high-speed measurement and auto mapping function. R-θ mode 106 points measurement of SiO2 film on Φ300mm Si substrate 120sec (including stage travelling time) Less than 1/5 of other conventional models!

  9. Auto mapping function UNECS-3000A has Φ300mm auto mapping function. The film thickness distribution on the substrate can be measured quickly and automatically by the combination of high-speed measurement and auto mapping function. ①Measurement position Set the measurement coordinate. ・R-θ (Radius-angle) mode ・X-Y(Vertical-horizontal) mode ① ② ②Measurement result Display measurement result (thickness, refractive index, etc) real time. UNECS（小型）資料

  10. Auto mapping function UNECS-3000A has Φ300mm auto R-θ stage. The positions set in the program are measured by auto mapping. The film thickness distribution on the substrate can be measured quickly and automatically by the combination of high-speed measurement and auto mapping function. R-θ stage which has position pins and a vacuum chuck function for φ100, 125, 150, 200, 300mm wafer. Load position Unload position UNECS（小型）資料

  11. SiO2 Si substrate Measurement repeatability • Excellent measurement repeatability was achieved simultaneously with ultra high-speed measurement. Standard sample(SiO2/Si) Thickness : 205.7±0.7nm Refractive index:1.460 (wavelength: 633nm) UNECS（小型）資料

  12. Material table file • Material table file containing the optical constants of film or substrate is saved in advance. So users can easily edit and add material table files by themselves. UNECS（小型）資料

  13. Features of UNECS series • UNECS series is the high-speed spectroscopic ellipsometer which can evaluate quickly the thickness and the distribution of optical constants of thin film with high-speed measurement utilizing snapshot method and auto mapping function (*1).High-speed and highprecision evaluation of the distribution is possible with simple recipe setting. • High-speed measurement • Snapshot method measurement of spectroscopic ellipsometry using high-order retarders makes high-speed measurement which has not been possible by conventional method. • Compact design • The sizes of emitter and receiver of sensor unit are very small due to the spectroscopic ellipsometer by utilizing high-order retarders. • Excellent cost performance • Other than the main measurement unit with a Φ300mm(*1)/Φ200mm(*2) motorized stage, a laptop PC with data analysis software is configured as a standard accessory. • Customized material table • Users can easily edit and add material table files by themselves. • Auto mapping function (*1) • UNECS-3000A hasφ300mm auto mapping function. • Multilayer film measurement • It is possible to measure multilayer film thickness up to 6 layers. *1：UNECS-3000A *2：UNECS-2000

  14. System configuration • ■ Standard system configuration • Main unit(with motorized stage, light source, spectrometer inside) • Controller (separate UNECS-3000A） • Laptop PC for control, data analysis software • ■Optional • Standard sample(100nm, SiO2/Si) Easy set-up by connecting main unit and PC by 2 of USB cables. Data analysis software is operable off line. UNECS-2000→ ＋ ←UNECS-3000A UNECS（小型）資料

  15. ～V Conventional method Phase modulation type Element rotation type Polarization characteristic of optical element by electrical control Polarization characteristic control by rotating optical element • Because mechanical or electrical polarization characteristic control, • The construction of sensor is complicated and the size is big. • Measurement time is long. It is hard to miniaturize sensor and reduce measurement time! UNECS（小型）資料

  16. Measurement method of UNECS UNECSadopts spectroscopic ellipsometry using high-order retarders, it makes instantaneous measurement at the snapshot since the spectrum which is obtained by polarization interferencechanges depending on the wavelength. Optical fiber Emitter Receiver 50mm Spectrometer Halogen lamp Light polarizer Retarder 1 Retarder 2 Analyzer Sample • Ultra high-speed measurement(Min.20ms~) • Compact design • Maintenance free It needs no mechanical or electrical components for polarization control which other conventional models have. UNECS（小型）資料

  17. UNECS-2000 basic specification ※1 The semitransparent film is the upper bound in the measurement film thickness. ※2 When only the film thickness value is assumed to be a fitting parameter, and the SiO2 film (about 100nm) on the Si substrate is measured. ※3 When SiO2 single-layer film on Si wafer is measured. ※4 Standard deviation (1σ) when measuring it continuousness ten times. ※5 Material data can be added by the user.

  18. UNECS-3000A basic specification ・Sampling time : 20ms ~ ・Analysis time : 300ms ・Sampling + Analysis: 320ms ~ ※1 The semitransparent film is the upper bound in the measurement film thickness. ※2 When only the film thickness value is assumed to be a fitting parameter, and the SiO2 film (about 100nm) on the Si substrate is measured. ※3 When SiO2 single-layer film on Si wafer is measured. ※4 Standard deviation (1σ) when measuring it continuousness ten times. ※5 Material data can be added by the user.

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